Plasma Coating System.
Contract notice: Plasma coating system
the application includes plasma ion deposited deposition (piad) deposition of glassy films and metals with high deposition rates (a few m / min) and large film thicknesses in the range of 100 nm to 100 m in a research and development environment .the physical atomization is done by evaporation by electron beam (e-beam deposition). Steamed prefabricated substrates in a suitable holder. Substrates include glass and semiconductor wafers, Printed circuit boards, Heat sinks, Dcb substrates, And semiconductor devices that differ in shape, Size, And finish.
This contract is divided into lots: No
time limit for receipt of tenders or requests to participate: Date: 20/07/2018
local time: 23:59
Major organization : FRAUNHOFER GESELLSCHAFT ZUR FRDERUNG DER ANGEWANDTEN FORSCHUNG E.V. BER VERGABEPORTAL DEUTSCHE E-VERGABE
Address : Hansastr. 27C
Email : email@example.com
Url : http://www.fraunhofer.de
Tender notice number : 267790-2018
Notice type : Tender Notice
Open date : 2018-07-20
Tender documents : T435507846.html
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|Date:||Jun 22, 2018|
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