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Ion Beam Etcher for nanofabrication.

Contract notice: Ion Beam Etcher for nanofabrication.

We seek a complete turn-key, standalone Ion Beam Etcher capable of very accurate etching of thin, nanometer-scale structures. The tool can be used for silicon and III-V semiconductors, but also to etch metals and various insulators on chips and wafers up to 150 mm.

More detailed requirements are presented in the invitation to tender, available on request at: registry@aalto.fiPlease include the reference D/119/01.01.04.00/2014 in the request message.

This contract is divided into lots: no

Deposits and Guarantees required: Please refer to the invitation to tender, available on request at registry@aalto.fiPlease include the reference D/119/01.01.04.00/2014 in the request message.

Time limit for receipt of tenders or requests to participate: 6.2.2015 - 13:00

Language(s) in which tenders or requests to participate may be drawn up: English. Finnish.

Tender documents : T25486195.html

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Publication:Mena Report
Date:Jan 15, 2015
Words:167
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