Ion Beam Etcher for nanofabrication.
Contract notice: Ion Beam Etcher for nanofabrication.
We seek a complete turn-key, standalone Ion Beam Etcher capable of very accurate etching of thin, nanometer-scale structures. The tool can be used for silicon and III-V semiconductors, but also to etch metals and various insulators on chips and wafers up to 150 mm.
More detailed requirements are presented in the invitation to tender, available on request at: firstname.lastname@example.orgPlease include the reference D/119/01.01.04.00/2014 in the request message.
This contract is divided into lots: no
Deposits and Guarantees required: Please refer to the invitation to tender, available on request at email@example.comPlease include the reference D/119/01.01.04.00/2014 in the request message.
Time limit for receipt of tenders or requests to participate: 6.2.2015 - 13:00
Language(s) in which tenders or requests to participate may be drawn up: English. Finnish.
Tender documents : T25486195.html
2014 Al Bawaba (Albawaba.com) Provided by SyndiGate Media Inc. ( Syndigate.info ).
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|Date:||Jan 15, 2015|
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