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Handbook of photomask manufacturing technology.


Handbook of photomask manufacturing technology.

Ed. by Syed Rizvi.

Taylor & Francis


704 pages




It used to be simply "photolithography"; now we have "nanolithography." The 31 chapters here have been written by those who ushered in the change, along with those whose research will place even more features on an ever-smaller space. General topics cover the design, processes and equipment created for production in such topics as mask writing (including e-beam and laser mask writers), conventional and advanced optical masks, NGL masks such as electron beam projection and ion projection lithography, mask processing, materials and pellicles, including descriptions of mask substrates, resists, and optical properties, and mask metrology, inspection, evaluation, and repairs (yes, they can be done). The final chapter describes modeling and simulation in the development of photomasks.

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Publication:SciTech Book News
Article Type:Book Review
Date:Sep 1, 2005
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