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Automated contamination management system.

The ADPC 302 from Pfeiffer Vacuum is an in-process contamination management system for particle contamination monitoring in the semiconductor industry. The product measures the number of particles in wafer transport carriers. The fully automated process localizes and counts particles from the carrier surfaces, including the door. Sub-micrometer particles can cause defects that may lead to considerable yield loss. This system can be used for both serial production as well as R&D analysis. The dry process shows clear benefits compared to the traditional wet method. The main advantage of the dry process is that the particle measurement is completely automated. It is integrated in the production process and therefore does not require time outside the production period. Pfeiffer Vacuum, Inc., 603-578-6500

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Title Annotation:LAB AUTOMATION
Publication:Laboratory Equipment
Date:Aug 1, 2013
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