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Advantest offers CD-SEM metrology tool for photomask applications.

TELECOMWORLDWIRE-6 January 2010-Advantest offers CD-SEM metrology tool for photomask applications(C)1994-2010 M2 COMMUNICATIONS

Semiconductor test equipment supplier Advantest Corporation (TSE:6857) (NYSE:ATE) declared on Tuesday the availability of its new Scanning Electron Microscope (SEM) technology-based Critical Dimension (CD) measurement system for photomasks.

The E3610 and E3620 advanced mask metrology tools, which have been developed and manufactured by Advantest since 2004 on an OEM basis for a supplier of metrology systems, are now available directly from Advantest.

SEM technology uses an electron beam to take measurements and create images on a semiconductor wafer at resolutions greater than those captured by optical microscopes.

Semiconductor manufacturers require CD-SEM measurement systems to measure the critical dimension of the miniature-sized circuits in a semiconductor and to assure accuracy in manufacturing, Advantest said.

Pricing details were not announced.

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Date:Jan 6, 2010
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