APPLIED MATERIALS' QUANTUM LEAP SYSTEM IN DEMAND AS THE INDUSTRY MOVES TO NEW CHIP DESIGNS.
Applied Materials Inc., a leading suppler of high current ion implanters, has shipped multiple Quantum LEAP (Low Energy Advanced Processing) ion implantation systems to customers in the US, Europe,
Taiwan and Singapore since its introduction in July 1999. One of the first Quantum systems was shipped to Lucent Technologies' Cirent Semiconductor facility in Oralndo, Fla., for the formation of advanced transistor structures in its next-generation communications semicondcutors.
The new Quantum ion implantation system uses a new, small footprint platform that bridges 200mm and 300mm wafer sizes. High throughput and productivity are possible at low energies down to 200eV -- a requirement for the critical implants used in 0.18 micron and below devices. The Quantum system's extremely short beam path minimizes beam "blow up" and enrgy contamination, with new technology that ensures energy accuracy and control for ultra-low energy implants to +/- 0.5 percent.
Quantum implanters are currently available in three models: the Quantum LEAP technology, which offers an ultra-low energy range of 200eV to 80keV; the Quantum 80, which covers a range of 2keV to 80keV; and the Quantum 120, which performs at an extended upper energy range fo 120keV.
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|Title Annotation:||Company Business and Marketing|
|Comment:||APPLIED MATERIALS' QUANTUM LEAP SYSTEM IN DEMAND AS THE INDUSTRY MOVES TO NEW CHIP DESIGNS.(Company Business and Marketing)|
|Publication:||EDP Weekly's IT Monitor|
|Date:||Apr 10, 2000|
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