ALTIS SEMICONDUCTORS AND NOVA TO IMPLEMENT PROCESS CONTROL INFRASTRUCTURE.
The implementation of the new system by ALTIS, a joint subsidiary of IBM's Microelectronics division and Infineon Technologies, will complement Nova's Integrated Thickness Monitoring (ITM) systems already installed and running in the 0.18 micron ALTIS Semiconductor fab in Corbeil-Essonnes, France. The combined systems will form a unified process control system for the global CVD/CMP module.
Nova's systems measure every wafer immediately after it has been processed. Self-adjusting process control algorithms are using this high sampling rate and information on previously measured wafers to predict the required process parameters of the next wafer. This wafer-to-wafer closed loop feedback control can be applied separately to both CVD and CMP processes. Further, information on each specific wafer's film thickness from the CVD, has been fed forward to the CMP production cell. This data provides compensation for CVD chamber-to-chamber variations, enabling a tighter process window. A network infrastructure is used to supply both CVD and CMP post process measurement results to the fab host for further analysis by statistical tools.
Altis Semiconductor, a joint subsidiary of IBM Microelectronics Division and Infineon Technologies, was created in July 1999. This new company was founded at the former IBM semiconductor manufacturing site located at Corbeil-Essonnes, France. Its leading edge technology includes Logic components of 0.18 microns using copper interconnects and advanced memory components (64 and 256 Mb DRAM).
Nova Measuring Instruments Ltd. is a recognized market leader in integrated process control for the semiconductor manufacturing industry. The company provides a broad range of integrated solutions to link between different IC processes and equipment manufacturers.
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|Title Annotation:||Company Operations|
|Comment:||ALTIS SEMICONDUCTORS AND NOVA TO IMPLEMENT PROCESS CONTROL INFRASTRUCTURE.(Company Operations)|
|Publication:||EDP Weekly's IT Monitor|
|Date:||Sep 25, 2000|
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