Zygo Launches the KMS 100 DUV Photomask Pattern Fidelity Verification System At Semicon West.Business Editors/Technology Writers MIDDLEFIELD, Conn.--(BUSINESS WIRE)--July 16, 2001 Zygo Corporation (NASDAQ NASDAQ in full National Association of Securities Dealers Automated Quotations U.S. market for over-the-counter securities. Established in 1971 by the National Association of Securities Dealers (NASD), NASDAQ is an automated quotation system that reports on :ZIGO), a world leader in optical precision measuring equipment, announced today the introduction of the ZYGO KMS KMS - Knowledge Management System 100(TM) DUV DUV Deep Ultraviolet DUV Data-Under-Voice DUV Design Under Verification Photomask Pattern Fidelity Verification System at Semicon West 2001. The KMS 100(TM) is ZYGO's latest generation KMS system, expressly designed to verify and certify that reticle CD error budgets and CD tolerances conform with those imposed by the ITRS ITRS International Technology Roadmap for Semiconductors ITRS International Terrestrial Reference System ITRS International Transaction Reporting System (EU) ITRS International Technical Rescue Symposium 2000 roadmap 100nm technology node. "The KMS 100(TM) will enable both the reticle manufacturers to certify that the subwavelength patterned reticles conform with customers' design parameters, and the process engineers in the fab to verify the integrity and quality of the reticle before loading onto a lithography tool to print silicon," stated Richard Eandi, product manager for the KMS 100(TM). "The KMS 100(TM) comes `virtual stepper step·per n. 1. One that steps, especially in a fast or spirited manner. 2. Informal A dancer. Noun 1. ready' with fully integrated Virtual Stepper(TM) simulation software from Numerical Technologies, Inc. (NASDAQ:NMTC NMTC New Market Tax Credit NMTC Northern Maine Technical College NMTC Northeastern Maryland Technology Council NMTC National Maintenance Training Center NMTC Negative Moderator Temperature Coefficient ). This enhancement permits the KMS 100(TM) to conduct offline wafer printability analysis and post-repair verification of mask defect printability," continued Mr. Eandi. The KMS 100(TM) utilizes a new ZYGO sealed and air-cooled 244nm laser illumination source, a new air-spaced ELWD, 0.75NA DUV objective for through-pellicle metrology; a new high resolution positioning stage incorporating ZYGO's ZMI ZMI Zope Management Interface ZMI Zion Ministerial Institute 510 High Stability Plane Mirror Interferometer interferometer: see interference under Interference as a Scientific Tool. See also virtual telescope. An instrument that measures the wavelengths of light and distances. and planar optics, and new proprietary optical proximity effect (OPE a. 1. Open. On Sunday heaven's gate stands ope. - Herbert. v. t. & i. 1. To open. Wilt thou not ope thy heart to know What rainbows teach and sunsets show? - Emerson. ) correcting algorithms, to deliver the optical resolution, linearity, and precision necessary for measuring subwavelength features on advanced reticles. The KMS 100(TM) has a demonstrated 3(sigma) repeatability of less than 1.1nm, stage positioning error less than 0.2(mu)m, and linearity down to 0.25(mu)m on isolated lines and 0.35(mu)m on dense line/space arrays. For more information on the KMS 100(TM) and other ZYGO products, please contact your local ZYGO office or visit our website, www.zygo.com. Founded in 1970, Zygo Corporation is an emerging supplier of optical components and modules for the telecommunications market and a leading designer, developer, and manufacturer of optics and on-line yield enhancement solutions for the semiconductor and industrial manufacturing markets. This press release may contain forward-looking statements within the meaning of Section 27A of the Securities Act of 1933, as amended, and Section 21E of the Securities Exchange Act of 1934, as amended, which reflect the Company's current judgment on certain issues. Because such statements apply to future events, they are subject to risks and uncertainties that could cause the actual results to differ materially. Important factors, which could cause actual results to differ materially, are described in the Company's reports on Form 10-K and 10-Q and other documents on file with the Securities and Exchange Commission. |
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