Zygo's New KMS100 DUV Photomask Pattern Fidelity Verification System Judged Tool of Choice In Customer Evaluation Trials.

Business and Technology Editors

MIDDLEFIELD, Conn.--(BUSINESS WIRE)--May 1, 2002

Zygo Corporation (NASDAQ:ZIGO), a world leader in optical precision measuring equipment, announced today that the Customer On Site Evaluation Program for its new KMS100(TM) DUV mask metrology and defect inspection system has been very successful in meeting the ITRS 2001 Roadmap CD mask metrology requirements for the 90nm technology node.

The first customer evaluation trial has resulted in an order for the AutoKMS100(TM), the fully automated mask handling version of the tool.

"The KMS100(TM) will enable mask makers to confirm that subwavelength patterned reticles conform with design parameters, and mask users to verify the integrity and quality of their reticles before loading them onto a lithography tool to print silicon," stated Richard Eandi, product manager for the KMS100(TM). "The KMS 100(TM) comes `virtual stepper ready' with fully integrated Virtual Stepper(TM) simulation software from Numerical Technologies, Inc. (NASDAQ:NMTC - news). This enhancement permits the KMS100(TM) to conduct offline wafer printability analysis and post-repair verification of mask defect printability," continued Dr. Eandi.

The KMS 100(TM) utilizes the new ZYGO Metrolase(TM) sealed and air-cooled 244nm gas laser illumination source matched with two new catadioptric lenses custom-tuned for 244nm imaging. The new Metrolase(TM) laser illumination system alone improves the cost of ownership of the KMS100 by a factor of three over the traditional metal halide arc lamp illumination systems. The ELWD, 0.75NA 244nm objective is designed for through-pellicle metrology and inspection, while the new high resolution, 0.90NA 244nm objective can resolve and measure CDs as small as 200nm on the reticle.

The KMS100(TM) also features a new high resolution positioning stage incorporating ZYGO's ZMI 510 High Stability Plane Mirror Interferometer and planar optics, and new Zygo proprietary optical proximity effect (OPE) correcting algorithms, to deliver the optical resolution, linearity, and precision necessary for measuring subwavelength features on advanced reticles. The KMS100(TM) DUV Mask Pattern Fidelity Verification System has been expressly designed for ease of maintenance, ease of operator programming and control, and requires minimal preventive maintenance schedules. The system is available in both manual loading and fully automated mask handling versions, with SECS/GEM software protocol, and conforms to the latest SEMI Standards.

ZYGO is also a member of the X-Initiative semiconductor supply-chain consortium that is promoting the industry-wide adoption of the revolutionary X Architecture, a revolutionary interconnect architecture based on the pervasive use of diagonal routing. The first X Architecture masks have been successfully measured using ZYGO KMS metrology systems.

For more information on the KMS100(TM) or scheduling a Customer On Site Evaluation, please contact your local ZYGO office or visit our website, www.zygo.com.

Founded in 1970, Zygo Corporation is an emerging supplier of optical components and modules for the telecommunications market and a leading designer, developer, and manufacturer of optics and on-line yield enhancement solutions for the semiconductor and industrial manufacturing markets.

This press release may contain forward-looking statements within the meaning of Section 27A of the Securities Act of 1933, as amended, and Section 21E of the Securities Exchange Act of 1934, as amended, which reflect the Company's current judgment on certain issues. Because such statements apply to future events, they are subject to risks and uncertainties that could cause the actual results to differ materially. Important factors, which could cause actual results to differ materially, are described in the Company's reports on Form 10-K and 10-Q and other documents on file with the Securities and Exchange Commission.