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Veeco Receives Orders for Multiple New ALD Systems for Next Generation Thin Film Magnetic Heads.

Provides faster deposition rates than traditional ALD systems

WOODBURY, N.Y. -- Veeco Instruments Inc. (Nasdaq: VECO) announced today that it has received multiple orders for the new NEXUS[R] Atomic Layer Deposition (ALD) System from global thin film magnetic head manufacturers. The next generation NEXUS ALD tool is designed specifically to meet the film requirements of advanced technology Perpendicular Magnetic Recording (PMR) heads. Key benefits include a high deposition rate combined with low stress and excellent conformality, all delivered with excellent cost of ownership.

"The next generation NEXUS ALD System incorporates newly developed technology that enables faster deposition rates than traditional ALD systems, along with proprietary techniques for stress control, to achieve the highest throughput and the lowest stress films in the industry," commented James T. Jenson, Veeco's Vice President and General Manager of PVD/ALD Equipment. "As manufacturers of thin film magnetic heads continue their transition to PMR technology, the NEXUS ALD System is a key enabler for advanced fabrication with a low cost of ownership."

Veeco's NEXUS ALD System deposits advanced dielectric and metal films for data storage applications with superior conformality at faster deposition rates than traditional ALD systems. Designed with high rate capability, Veeco's NEXUS ALD system is ideal for applications such as PMR write pole encapsulation. The system can also be operated in a low temperature mode, optimized for TMR sensor isolation. Each module can be configured to produce a range of films in both development and production modes. As part of Veeco's NEXUS family, it can be integrated on a common hardware and software platform with complementary Veeco technologies, such as ion beam etch, ion beam deposition and physical vapor deposition.

About Veeco

Veeco Instruments Inc. provides solutions for nanoscale applications in the worldwide semiconductor, data storage, HB-LED/wireless and scientific research markets. Our Metrology products are used to measure at the nanoscale and our Process Equipment tools help create nanoscale devices. Veeco's manufacturing and engineering facilities are located in New York, New Jersey, California, Colorado, Arizona and Minnesota. Global sales and service offices are located throughout the United States, Europe, Japan and Asia Pacific. Additional information on Veeco can be found at http://www.veeco.com/.

To the extent that this news release discusses expectations or otherwise makes statements about the future, such statements are forward-looking and are subject to a number of risks and uncertainties that could cause actual results to differ materially from the statements made. These factors include the risks discussed in the Business Description and Management's Discussion and Analysis sections of Veeco's Annual Report on Form 10-K for the year ended December 31, 2006 and in our subsequent quarterly reports on Form 10-Q, current reports on Form 8-K and press releases. Veeco does not undertake any obligation to update any forward-looking statements to reflect future events or circumstances after the date of such statements.
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Publication:Business Wire
Date:Jul 27, 2007
Words:475
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