Printer Friendly
The Free Library
22,725,466 articles and books

Veeco Receives First Order for New High-Rate PVD System for Next Generation Aluminum Oxide Deposition.

WOODBURY, N.Y. -- Veeco Instruments Inc. (Nasdaq: VECO VECO Vernier Engine Cut Off ) announced today that it has received the first order for its new NEXUS PVD-HR[R] Physical Vapor Deposition This article or section is in need of attention from an expert on the subject.
Please help recruit one or [ improve this article] yourself. See the talk page for details.
peripheral vascular disease

PVD Peripheral vascular disease, see there
) System from a leading manufacturer of hard disk drives. The system will be used for high-rate deposition of aluminum oxide aluminum oxide: see alumina.  for data storage applications. Veeco received the order during the first quarter of 2007.

Key technical features of the NEXUS PVD-HR System include the flexibility and process tune-ability of ion-assisted deposition with the high-rate requirements of thick overcoat applications. This reliable, high-throughput alumina PVD module provides high uniformity thickness and excellent wafer-to-wafer repeatability without target poisoning. Designed to provide arc-free and pinhole-free films, the tool incorporates "best-in-class" technology and components. As part of Veeco's NEXUS family, it can be integrated on a common hardware and software platform with complementary Veeco technologies such as ion beam deposition Ion Beam Deposition is a process of applying materials to a target through the application of an ion beam.

In an ion source source materials - gases or evaporated solids - are ionized using electron ionization or by application of high electric fields (Penning ion source).
, ion beam etch, atomic layer deposition A semiconductor manufacturing technique that deposits a single layer on a chip that is only one atom or one molecule thick. As elements on a chip decreased to below 100 nm, this essential technology for making the chip ever smaller became commercial after the turn of the 21st century.  and reactive sputtering A popular method for adhering thin films onto a substrate. Sputtering is done by bombarding a target material with a charged gas (typically argon) which releases atoms in the target that coats the nearby substrate. It all takes place inside a magnetron vacuum chamber under low pressure. .

"As our customers transition to next generation thin film magnetic heads, the NEXUS PVD-HR System becomes critical for meeting the industry's stringent requirements of throughput and uniformity," commented James T. Jenson, Veeco's Vice President, General Manager of PVD/ALD Equipment. "In addition to featuring high reaction rates, excellent quality films, low film stress and a high growth rate, Veeco's new PVD-HR's small footprint helps lower our customers' cost of ownership."

About Veeco

Veeco Instruments Inc. provides solutions for nanoscale applications in the worldwide semiconductor, data storage, HB-LED/wireless and scientific research markets. Our Metrology products are used to measure at the nanoscale and our Process Equipment tools help create nanoscale devices. Veeco's manufacturing and engineering facilities are located in New York, New Jersey, California, Colorado, Arizona and Minnesota. Global sales and service offices are located throughout the United States, Europe, Japan and Asia Pacific. Additional information on Veeco can be found at

To the extent that this news release discusses expectations or otherwise makes statements about the future, such statements are forward-looking and are subject to a number of risks and uncertainties that could cause actual results to differ materially from the statements made. These factors include the risk factors discussed in the Business Description and Management's Discussion and Analysis Management's discussion and analysis (MD&A)

A report from management to shareholders that accompanies the firm's financial statements in the annual report. It explains the period's financial results and enables management to discuss topics that may not be apparent in the financial
 sections of Veeco's Annual Report on Form 10-K for the year ended December 31, 2006. Veeco does not undertake any obligation to update any forward-looking statements to reflect future events or circumstances after the date of such statements.
COPYRIGHT 2007 Business Wire
No portion of this article can be reproduced without the express written permission from the copyright holder.
Copyright 2007, Gale Group. All rights reserved. Gale Group is a Thomson Corporation Company.

 Reader Opinion




Article Details
Printer friendly Cite/link Email Feedback
Publication:Business Wire
Date:Apr 24, 2007
Previous Article:Orbital Set to Launch Company-Built AIM Scientific Spacecraft for NASA Aboard Pegasus Rocket.
Next Article:Penns Woods Bancorp, Inc. Announces Extension of Stock Repurchase Program.

Related Articles
New Cymetra II Planetary Physical Vapor Deposition -PVD- System For GMR Spin Valves and Multilayers, and High Moment Poles/Shields.
Veeco Instruments and CVC, Inc. Complete Merger.
Veeco Introduces New Fiber Metallization System At OFC; Turnkey System Increases Device Reliability by Improving Hermetic Sealing.
Veeco Announces PVD Joint Technology Development Efforts With Two Japanese Customers for Next-Generation Thin Film Magnetic Heads.
Veeco Pursues Next-Generation Deposition Technologies.
ASM International N.V. and Veeco Instruments Sign a Licensing Agreement for Atomic Layer Deposition Technology.
Veeco Invests in Development of Next Generation Alumina Deposition Technology for Data Storage.
Veeco Hires Senior Executive to Lead PVD/ALD Product Lines.
Veeco Receives Order for New PVD Tool from Leading TFMH Manufacturer.
Veeco Receives Order for PVD System for Advanced Sensor Development.

Terms of use | Copyright © 2014 Farlex, Inc. | Feedback | For webmasters