Veeco Receives First Order for New High-Rate PVD System for Next Generation Aluminum Oxide Deposition.
Key technical features of the NEXUS PVD-HR System include the flexibility and process tune-ability of ion-assisted deposition with the high-rate requirements of thick overcoat applications. This reliable, high-throughput alumina PVD module provides high uniformity thickness and excellent wafer-to-wafer repeatability without target poisoning. Designed to provide arc-free and pinhole-free films, the tool incorporates "best-in-class" technology and components. As part of Veeco's NEXUS family, it can be integrated on a common hardware and software platform with complementary Veeco technologies such as ion beam deposition, ion beam etch, atomic layer deposition and reactive sputtering.
"As our customers transition to next generation thin film magnetic heads, the NEXUS PVD-HR System becomes critical for meeting the industry's stringent requirements of throughput and uniformity," commented James T. Jenson, Veeco's Vice President, General Manager of PVD/ALD Equipment. "In addition to featuring high reaction rates, excellent quality films, low film stress and a high growth rate, Veeco's new PVD-HR's small footprint helps lower our customers' cost of ownership."
Veeco Instruments Inc. provides solutions for nanoscale applications in the worldwide semiconductor, data storage, HB-LED/wireless and scientific research markets. Our Metrology products are used to measure at the nanoscale and our Process Equipment tools help create nanoscale devices. Veeco's manufacturing and engineering facilities are located in New York, New Jersey, California, Colorado, Arizona and Minnesota. Global sales and service offices are located throughout the United States, Europe, Japan and Asia Pacific. Additional information on Veeco can be found at http://www.veeco.com/.
To the extent that this news release discusses expectations or otherwise makes statements about the future, such statements are forward-looking and are subject to a number of risks and uncertainties that could cause actual results to differ materially from the statements made. These factors include the risk factors discussed in the Business Description and Management's Discussion and Analysis sections of Veeco's Annual Report on Form 10-K for the year ended December 31, 2006. Veeco does not undertake any obligation to update any forward-looking statements to reflect future events or circumstances after the date of such statements.