Varian Introduces a Breakthrough in Low-Defect, High-Output Ion Implantation; High Current VIISion Systems Combine Highest Throughput, Lowest Particle Generation For Industry's Best Wafer Yield.

PALO ALTO, Calif.--(BUSINESS WIRE)--Jan. 6, 1995--VIISion, Varian's new high-current ion implanter product line, combines the industry's highest throughput with the lowest achievable particle contamination.

The result is a single package that delivers the best wafer yield and output in the semiconductor industry. With VIISion, Varian helps reduce overall cost of ownership by maximizing system uptime and reliability, and by designing implanters with cleanroom faceprints and footprints that are up to 38% smaller than competing systems.

VIISion's high-output, dual-filament Bernas ion source, coupled with advanced beamline optics, maximizes beam currents at low energies. This results in a two- to six-fold improvement in wafer throughput over other implanters because VIISion systems offer twice the beam current for standard dopant species and up to six times the beam current for multiple-charged dopants. VIISion systems are characterized by high beam currents -- As: 40 keV, 20 mA, and B: 10 keV, 6 mA.

VIISion systems incorporate a number of unique features that result in the world's leading particle control with beam specification -- 0.11 p/cm2 for 0.2um (micron) particles. Horizontal wafer handling differentiates VIISion from competitive systems, which use "busy" wafer manipulation with up to a dozen motions and vertical handling to implant a wafer. The VIISion systems use simple, horizontal, and planar handling to maintain safely 200mm wafer integrity for up to 200 wafers per hour. Dummy wafer handling and three vacuum loadlocks maximize product handling efficiency and cleanliness. VIISion systems operate at one-half the base pressure of competing systems, further contributing to the overall cleanliness of the system.

The field-proven design of VIISion's plasma flood gun system (PFG) provides superior charge control with up to 30% yield improvements demonstrated. Over the full range of beam currents, the system automatically self regulates to ensure superior yield, even for devices with high charge sensitivity. The VIISion PFG offers a uniquely broad process window of operation -- simplifying process characterization and allowing for robust process control.

"Our customers want the best possible wafer yield at the lowest possible cost," said Charles McKenna, vice president and general manager of Varian Ion Implant Systems. "By listening to our customer's production challenges, we've developed VIISion, a fast, high-volume system that performs consistently and works continuously. This tool will certainly take our customers several device generations into the future."

Two VIISion Models

Two application-specific models are available to allow more effective utilization of equipment capital when building new fabs. The VIISion 80, with an energy range of 2 - 80 keV, provides cost-effective low energy, high-dose implantation for DRAM and most CMOS manufacturers. The VIISion 200, with an energy range of 2 - 200 keV, is a cost effective production tool with maximum flexibility in dose and energy without sacrificing low energy performance.

Greater than 90% parts commonality between the two systems makes it easy to mix VIISion models in the same fab. This helps ensure that the lowest capital investment will meet manufacturer's production capacity requirements.

With a maximum width of 2.7 meters, the VIISion 200 system saves valuable cleanroom and production space. The VIISion 80 measures only 13.7 square meters, nearly 40% smaller than comparable systems.

World Class Development, Design and Manufacturing

Varian VIISion incorporates an evolutionary design, based on more than 15 years of experience in producing high-performance, high-current ion implanters. Design of the VIISion system was concurrent with the manufacturing process. As a result, the system was thoroughly tested and proven throughout all stages of development prior to shipment of the first production system. "Poka-Yoke" designs, which ensure that parts or assemblies can be installed only one way, prevent incorrect assembly at the factory or during preventive maintenance or service at a customer site.

Varian Ion Implant Systems is the only International Standards Organization (ISO 9001) registered source for the development, design, and manufacture of ion implantation systems. ISO 9000 is an international series of standards for developing Total Quality Management.

Customer shipments of VIISion systems will begin in January 1995.

Varian is the acknowledged world leader in ion implanters, with more systems at work than those of all other suppliers combined.

Varian's semiconductor fabrication equipment, including its ion implanters and thin-film coating systems, are used by virtually every major semiconductor manufacturer in the USA, Japan, Korea, Taiwan, and Europe. Varian's semiconductor equipment business set a record for orders in 1994, soaring 87% over 1993 levels to $610 million. The business accounted for $477-million of the company's 1994 sales of $1.55 billion.

For additional information, literature contact:

-0- VARIAN SEMICONDUCTOR EQUIPMENT M/S H-105 3045 Hanover Street Palo Alto, CA 94303

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Varian Associates, Inc., is a diversified, international, high-technology company headquartered in Palo Alto, Calif. It produces systems and components for semiconductor, medical, communications, scientific, industrial, and defense markets worldwide.

CONTACT: Varian Associates Inc.

Judith Farrell, 415/424-5317