VESTA Ships Next Generation Atomic Layer Deposition Technology.SAN JOSE, Calif. -- VESTA Technology, Inc. announced that it shipped its next generation 300mm VULCAN(TM) Metal ALD/CVD System to major Japanese semiconductor manufacturer. VESTA's next generation Metal ALD/CVD technology provides solutions for logic and DRAM manufacturers for applications down to 45nm feature sizes and beyond. "We are extremely pleased with the growing demand for our advanced ALD ALD abbr. adrenoleukodystrophy ALD, n.pr See adrenoleukodystrophy. ALD aldolase. technology," said Dr. Karl Markert, VESTA's President & CEO (1) (Chief Executive Officer) The highest individual in command of an organization. Typically the president of the company, the CEO reports to the Chairman of the Board. . "Through our partnership with ATDF ATDF American Tap Dance Foundation ATDF Advanced Technology Development Facility, Inc (Austin, TX) ATDF ASCII Test Data Format (semi-conductor industry) ATDF Automated Target Data Fusion (Advanced Technology Development Facility), an independent subsidiary of SEMATECH SEMATECH Semiconductor Manufacturing Technology Inc., our advanced R&D and Customer Demonstration facility enables VESTA to continuously provide our customers with innovative and leading-edge technology solutions to address today's semiconductor device manufacturing challenges." VESTA's VULCAN(TM) Metal ALD/CVD System can provide in-situ and/or sequential dual mode of ALD with CVD CVD Cardiovascular disease, see there processing capability. VESTA's dual mode deposition technology integrates a precision ALD for initial layers with high throughput from various type of deposition obtained from gas phase of chemicals such as pseudo-ALD, pseudo-CVD, CVD, etc. for bulk layers such as TiN and Ti/TiN films. Both the initial ALD layer and the subsequent CVD fill are deposited within the same VULCAN(TM) Process Module with or without plasma option. The integration of in-situ and/or sequential deposition approach overcomes both the film quality limitation of CVD processing and the low deposition rate limitation of ALD processing. By adopting plasma technology, low temperature deposition is achieved for metal electrodes for high-k gate & capacitor applications, back-end-of the line (BEOL BEOL Back-End-Of-Line BEOL Bent's Old Fort National Historic Site (La Junta, Colorado) BEOL Bent's Old Fort National Historic Site (US National Park Service) ) applications, and applications utilizing polymeric substrates. "With the evolution of VESTA's next generation Metal ALD/CVD System, VESTA can provide complete ALD/CVD technology solution with technical flexibility of single wafer processing and the versatility of plasma capability for production requirement," said Dr. SI Lee, VESTA's CTO (Chief Technical Officer) The executive responsible for the technical direction of an organization. See CIO and salary survey. . "VESTA's success is due to its ability to offer revolutionary technology and proven production reliability with progressed developments for improved productivity performance." About VESTA Technology, Inc. VESTA, headquartered in San Jose, Calif. is a global technology, marketing, engineering, and service organization servicing the semiconductor and nano-technology industries. VESTA offers a complete range of services such as sales, applications support, system installations, warranty and post-warranty coverage. VESTA is exclusive partner and equipment provider of IPS Ltd. with an exclusive technology license and world-wide distributorship agreement. Additional information about the company can be found at www.vestatechnology.com. About IPS, Ltd. IPS is one of the fastest growing suppliers of advanced technology systems to the semiconductor industry in Korea. The company manufacturers Atomic Layer Deposition A semiconductor manufacturing technique that deposits a single layer on a chip that is only one atom or one molecule thick. As elements on a chip decreased to below 100 nm, this essential technology for making the chip ever smaller became commercial after the turn of the 21st century. (ALD), Metal ALD/VPD, Plasma Enhanced Dry Etch and LCD Etcher Systems. The company is publicly traded on the Korea Stock Market (KOSDAQ KOSDAQ Korean Securities Dealers Automated Quotations : 051820). IPS headquarters and manufacturing is located in Pyungtaek, Kyungki-do, Korea. Additional information about the company can be found at http://www.ips-tech.com/. |
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