Unaxis Semiconductors Introduces the VERSALINE, its Newest Deposition and Etching System for Volume Production.Business Editors/High-Tech Writers ST. PETERSBURG, Fla.--(BUSINESS WIRE)--Sept. 15, 2003 Today Unaxis Semiconductors introduced the VERSALINE(TM), a new system optimized to offer the lowest cost of ownership for single process module applications with cassette-to-cassette loading. The VERSALINE(TM) is a streamlined solution for production scenarios frequently encountered in today's compound semiconductor and microsystem fabrication. The VERSALINE(TM) system has a simple and reliable wafer handling and user interface, yielding improved reliability and cost effectiveness not possible with larger cluster-type configurations. The process modules for wafer size up to 200 mm, cover a wide range of unique deposition and etch processes. They are designed and built according to a standardized architecture to assure compatibility with the central handling unit, at the same time simplifying system configuration. The system can be equipped with a Large Area PECVD PECVD Plasma-Enhanced Chemical Vapor Deposition deposition module or the following etching modules: Inductively Coupled Plasma An inductively coupled plasma (ICP) is a type of plasma source in which the energy is supplied by electrical currents which are produced by electromagnetic induction, that is, by time-varying magnetic fields. (ICP (1) (Internet Cache Protocol) A protocol used by one proxy server to query another for a cached Web page without having to go to the Internet to retrieve it. See CARP and proxy server. ), Pulsed High Frequency (PHF) RIE or High Performance Oxide Etching (HiPOE). The control system used in the VERSALINE(TM) is a flexible service-based program using Control Works(TM)-based software, with common core software modules. As a standardized system interface it controls the recipe management, scheduling, data collection/logging and enabling functions such as e-diagnostics, data analysis and real-time fault detection. "For the VERSALINE(TM) we have developed new, benchmark setting processes for applications on compound and silicon materials including MEMS (MicroElectroMechanical Systems) Tiny mechanical devices that are built onto semiconductor chips and are measured in micrometers. In the research labs since the 1980s, MEMS devices began to materialize as commercial products in the mid-1990s. and thin film head applications," says Jim Pollock, Director Etch and PECVD SBU, Unaxis Semiconductors. "The VERSALINE(TM) ideally combines versatility with low cost of ownership. Our new tool together with the support of our experienced Unaxis professionals around the globe will secure our customers' success in the semiconductors business." About Unaxis Semiconductors Unaxis Semiconductors is a Division of Unaxis, a leading global provider of integrated manufacturing systems and services for Information Technology markets, such as semiconductors, data storage, flat panel displays, optical components, and selected non-IT markets. Unaxis Semiconductors offers a comprehensive range of innovative thin film production solutions for the Advanced Silicon (Si and SiGe applications, as well as Photomask technologies), Advanced Packaging (all thin film wafer level packaging technologies) and Compound Semi & Microtechnology (high frequency, optical and non-silicon based technologies and MEMS) markets. Process technologies include PVD PVD abbr. peripheral vascular disease PVD Peripheral vascular disease, see there , PECVD, UHV-CVD UHV-CVD Ultra-High Vacuum Chemical Vapor Deposition , LEPC LEPC Local Emergency Planning Committee LEPC Law Enforcement Planning Commission LEPC Local Emergency Preparedness Committee LEPC Low Energy Pion Channel LEPC Local Emergency Preparedness Coordinator , LEPECVD LEPECVD Low Energy Plasma Enhanced Chemical Vapor Deposition , etching (RIE, ICP) and RTP. Global Support is provided through two technology centers and over 40 sales, service and spare parts centers. |
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