Toshiba, Shibaura Mechatronics, Chlorine Engineers Announce First Practical Application of Electrolyzed Sulfuric Acid Method.Tokyo, Japan, Feb 27, 2007 - (JCN JCN Japan Corporate News JCN Journal of Cognitive Neuroscience JCN Journal of Cardiovascular Nursing JCN Journal of Christian Nursing JCN Job Control Number JCN Journal of Child Neurology JCN joint communications network (US DoD) ) - Toshiba, Shibaura Mechatronics (MECHAnics elecTRONICS) The combination of mechanical and electronic systems. Embracing robotics, industrial control systems and human interfaces in numerous disciplines, mechatronics is a major step beyond "electromechanical," in which only electricity is required. Corporation and Chlorine Engineers announced that they have succeeded in developing the industry's first semiconductor resist stripping technology employing electrolyzed sulfuric acid sulfuric acid, chemical compound, H2SO4, colorless, odorless, extremely corrosive, oily liquid. It is sometimes called oil of vitriol. Concentrated Sulfuric Acid . The "resist" is a masking material used in the lithographic lith·o·graph n. A print produced by lithography. tr.v. lith·o·graphed, lith·o·graph·ing, lith·o·graphs To produce by lithography. process that forms semiconductor circuits on a chip substrate. Once the circuit is etched, the resist must be removed by using peroxymonosulfuric acid (produced by mixing sulfuric acid with hydrogen peroxide hydrogen peroxide, chemical compound, H2O2, a colorless, syrupy liquid that is a strong oxidizing agent and, in water solution, a weak acid. It is miscible with cold water and is soluble in alcohol and ether. ). The new technology reduces the volume of sulfuric acid used in the resist stripping process by 70% and totally eliminates the use of hydrogen peroxide. With the new technology, peroxymonosulfuric acid can be produced without hydrogen peroxide but by electrolyzing the sulfuric acid. As a result, the new technology is more eco-friendly as well as more efficient. The electrolyzed sulfuric acid can also be recycled (which was not possible with the old technology) and the process reduces the resist stripping time by up to 20%. Toshiba, Shibaura and Chlorine have already developed a single-wafer resist stripping system that will be integrated into the resist stripping process at Toshiba's Yokkaichi plant in April Shibaura and Chlorine plan to sell the current resist stripping system as well as the new electrolyzed sulfuric system. Copyright [c] 2007 Japan Corporate News Network. All rights reserved. |
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