Tokyo Electron Low-K Toolset Used At International SEMATECH for Low-K Material Evaluations.

Business Editors and High-Tech Writers

TOKYO--(BUSINESS WIRE)--March 27, 2000

Tokyo Electron Limited's (TEL) low-k tools are the spin-on deposition and cure systems currently in use at International SEMATECH in their evaluation of low-k materials.

Also during this evaluation, TEL successfully demonstrated etch of all low-k materials available for processing on the TEL etchers.

Lou Steen, Tokyo Electron America's Vice President of Marketing, stated, "In total, three of the four tools in TEL's integrated low-k toolset were used during the International SEMATECH material evaluations. The TEL toolset is comprised of deposition, cure, etch and cleaning equipment. The CLEAN TRACK ACT 8 SOD, with its spinner and thermal modules, is a natural extension of TEL's production proven lithography track," said Steen. "Precise furnace curing with superior ambient control is accomplished in the Alpha-8SE. TEL's Unity system has the flexibility to etch multiple low-k films with high selectivities using the DRM chamber. TEL also offers the PR-Series Cleaning System for Cu and Low-K process flows, designed for the most efficient carrierless wet cleaning."

International SEMATECH has completed the first phase of material evaluations used in the fabrication of one-level metal damascene devices. Most of the dielectric materials they investigated were applied using a spin-on technique. Asahi Chemical (ALCAP-S); Dow Chemical (SILK, BCB); Dow Corning (XLK, 3MS); Hitachi Chemical (HSG RZ25); Honeywell Electronic Materials (HOSP, FLARE, Nanoglass); JSR (LKD), Battelle PNNL (Mesoporous silica); and Schumacher (PAE-2) provided the spin-on materials.

Paul Winebarger, Director of Interconnect at International SEMATECH, said, "Tokyo Electron tools and support have been key elements of International SEMATECH's evaluations of low-k materials. Our objective is to provide member companies with information that will enable them to select the most promising materials for their advanced manufacturing processes. Our program focuses on a number of critical issues, including extensive material characterization, process integration and electrical performance."

International SEMATECH will now begin focusing on ultra low-k materials, with the objective to achieve dielectric constants below 2.0, for the generations following 180 nm. According to Steen, "All materials currently available with this property require spin-on application. TEL is uniquely positioned to support the deployment of ultra low-k materials with our low-k toolset."

Tokyo Electron Limited (TEL), established in 1963 and based in Tokyo, Japan, is a leading supplier of innovative semiconductor production equipment worldwide, with revenues in excess of 313.8 billion yen, or approximately 3 billion dollars. In 2000, TEL is forecasting revenues of 433 billion yen, or approximately 4 billion dollars. TEL also imports, for the Japanese market, leading-edge semiconductor production equipment from around the world and provides these systems with complete support. TEL is a publicly held company listed on the Tokyo Stock Exchange. www.tel.co.jp

Tokyo Electron America (TEA), a subsidiary of TEL, is headquartered in Austin, Texas. TEA provides sales and service for TEL products from 15 offices across the United States. Products include coater/developers, oxidation/diffusion furnaces, CVD and PVD systems, Wet Cleaning Systems and Wafer Probers. TEL has further invested in the North American market by manufacturing products in Massachusetts (TEM), Texas (TEX), Oregon (TEO) and Arizona (TAZ). www.telusa.com

Based in Austin, Texas, International SEMATECH is a non-profit research and development consortium of the following semiconductor manufacturers: AMD, Conexant, Hewlett-Packard, Hyundai, Infineon Technologies, Intel, IBM, Lucent Technologies, Motorola, Philips, STMicroelectronics, TSMC and Texas Instruments. Additional information on International SEMATECH can be found at www.sematech.org.