Tokyo Electron (TEL) Releases Trias(TM) LT Ti/TiN, the Company's Newest Metal CVD System for 45 nm Generation Contact Applications.TOKYO -- TEL TEL Telephone TEL Telegram TEL Telugu (langauge) TEL Terrorist Exclusion List TEL Technology-Enhanced Learning TEL Transporter-Erector-Launcher TEL Tetra-Ethyl Lead TEL Team Deutsche Telekom (Tokyo Electron) today announced the company's latest 300mm metal CVD CVD Cardiovascular disease, see there (chemical vapor deposition Vapor deposition Production of a film of material often on a heated surface and in a vacuum. Vapor deposition technology is used in a large variety of applications. ) system Trias(TM) LT Ti/TiN. The new system enables deposition of Ti (Titanium) and TiN (Titanium Nitride) films in low temperature process regimes. Based on the industry-proven Trias platform, the Trias LT Ti/TiN meets the increasing demands for low temperature processing required in the manufacture of nickel silicide sil·i·cide n. A compound of silicon with another element or radical. Noun 1. silicide - any of various compounds of silicon with a more electropositive element or radical contacts. The system incorporates an enhanced shower head design, which allows wafer temperature control over a wide range of deposition temperatures. By applying TEL's novel processing technology and improved shower head design to contact processing, the Trias LT achieves improvements in barrier metal step coverage while enabling low contact resistance and reduced junction leakage. In addition, the Trias LT produces excellent film uniformity, improved repeatability and enhanced particle performance. "As we move toward 45 nm contacts, the unique low temperature processing technology offered by TEL's new metal CVD system will enable customers to extend the range of processing applications for next generation devices and beyond," said Kenji Washino, General Manager for TEL's Single Wafer Deposition Business Unit. About TEL TEL, established in 1963, is a leading supplier of innovative semiconductor and FPD (1) (Flat Panel Display) See LCD, plasma display, EL display, FED and flat panel display. (2) (Field Programmable Device) An umbrella term for all chips that can be programmed by the customer including SPLDs, CPLDs and FPGAs. See PLD. production equipment worldwide. In Japan, TEL also distributes computer network related products and electronic components of global leading suppliers. To support this diverse product base, TEL is strategically located around the world. TEL is a publicly held company listed on the Tokyo Stock Exchange Tokyo Stock Exchange Main stock market of Japan, located in Tokyo. It opened in 1878 to provide a market for the trading of government bonds newly issued to former samurai. . www.tel.com |
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