Printer Friendly
The Free Library
5,679,181 articles and books
Member login
User name  
Password 
 
Join us Forgot password?

Tokyo Electron (TEL) Introduces TELINDY(TM) IRad(TM) Plasma Enhanced CVD Reactor.


TOKYO -- Tokyo Electron (TEL TEL Telephone
TEL Telegram
TEL Telugu (langauge)
TEL Terrorist Exclusion List
TEL Technology-Enhanced Learning
TEL Transporter-Erector-Launcher
TEL Tetra-Ethyl Lead
TEL Team Deutsche Telekom
), a world leader in thermal processing systems, today announced that the company will release TELINDY IRad in April 2007 for high-volume manufacturing of advanced plasma-enhanced nitride films. TELINDY IRad is based on the design of the TELINDY batch reactor that has been in production for various applications since earlier this year.

Plasma-enhanced chemical vapor deposition (PECVD PECVD Plasma-Enhanced Chemical Vapor Deposition ) processes are typically performed in single wafer reactors. The design of IRad challenges conventional wisdom by incorporating a plasma source in the reaction chamber of a multi-thermal CVD CVD Cardiovascular disease, see there  system.

Originally developed for the industry-proven TELFORMULA platform, IRad in-situ plasma source allows chemical reactions to proceed at the lower temperatures required for advanced sub 45nm processing. This technology has been incorporated into TEL's large batch platform, the TELINDY. Offering a 100-wafer load size, TELINDY IRad's unique reactor design provides an optimized hardware configuration that increases tool uptime by enabling both deposition and dry clean processing.

Furthermore, combining IRad in-situ plasma source with TEL's MLD MLD median lethal dose; minimum lethal dose.

MLD or mld
abbr.
minimal lethal dose


MLD,
n See dose, lethal, minimum.


MLD

minimum lethal dose.
 (molecular layer deposition) technology successfully produces stoichiometric stoi·chi·om·e·try  
n.
1. Calculation of the quantities of reactants and products in a chemical reaction.

2. The quantitative relationship between reactants and products in a chemical reaction.
 SiN films and variations thereof. TELINDY IRad also offers conformal deposition on features with aggressive A/R for advanced memory and logic structures that require precise control of stoichiometry stoichiometry

Determination of the proportions (by weight or number of molecules) in which elements or compounds react with one another. The rules for determining stoichiometric relationships are based on the laws of conservation (see
 and uniformity.

"With TELINDY IRad, TEL's Thermal Processing Systems business unit is demonstrating that leading-edge technology films and cost competitiveness can coexist in the same solution set," said Ken Sato, president of Tokyo Electron Limited.

TEL continues to make breakthrough advancements in thermal processing technology through more efficient reactors that address the technical requirements faced by semiconductor manufacturers in their efforts to develop sub-45nm nodes. For more information about TELINDY IRad, please visit us at Semicon Japan at booth # 2D-1001.

About TEL

TEL, established in 1963, is a leading supplier of innovative semiconductor and FPD production equipment worldwide. In Japan, TEL also distributes computer network-related products and electronic components of global leading suppliers. To support this diverse product base, TEL is strategically located around the world. TEL is a publicly held company listed on the Tokyo Stock Exchange Tokyo Stock Exchange

Main stock market of Japan, located in Tokyo. It opened in 1878 to provide a market for the trading of government bonds newly issued to former samurai.
. www.tel.com
COPYRIGHT 2006 Business Wire
No portion of this article can be reproduced without the express written permission from the copyright holder.
Copyright 2006, Gale Group. All rights reserved. Gale Group is a Thomson Corporation Company.

 Reader Opinion

Title:

Comment:



 

Article Details
Printer friendly Cite/link Email Feedback
Publication:Business Wire
Date:Dec 5, 2006
Words:340
Previous Article:The Interactive Advertising Bureau Appoints Randall Rothenberg as New CEO.
Next Article:PaperFree Medical Solutions, Inc. (PFMS.OB) Secures a Billing Management and Claims Processing Contract With Bona Vista Programs.
Topics:



Related Articles
Applied Materials Introduces Nitride550 CVD Process to Enable Next-Generation Transistor Structures.
TEL Announces Release of New Plasma Nitridation System.
TEL Releases Trias SPA Plasma Processing System Capable of Handling High-Speed Radical Oxidation Processes.
TEL to Begin Taking Orders for the Vesta, Its Next-Generation 300mm Process Etching Chamber.
Tokyo Electron (TEL) Introduces Plasma-Enhanced Batch Thermal CVD System.
TEL Delivers Latest CVD Deposition Tool, Trias(TM) PZT, for FeRAM Application.
Applied Materials Wins 2005 ``Best CVD Product'' Award from TSMC.
TEL Releases High Productivity Thermal Processing System, TELINDY.
Tokyo Electron's TELINDY(TM) in Full Scale Production.
Tokyo Electron (TEL) Releases Trias(TM) LT Ti/TiN, the Company's Newest Metal CVD System for 45 nm Generation Contact Applications.

Terms of use | Copyright © 2009 Farlex, Inc. | Feedback | For webmasters | Submit articles