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Tokyo Electron (TEL) Introduces Plasma-Enhanced Batch Thermal CVD System.


TOKYO -- Tokyo Electron (TEL TEL Telephone
TEL Telegram
TEL Telugu (langauge)
TEL Terrorist Exclusion List
TEL Technology-Enhanced Learning
TEL Transporter-Erector-Launcher
TEL Tetra-Ethyl Lead
TEL Team Deutsche Telekom
) introduces IRad-, a 300mm plasma-enhanced batch thermal CVD CVD Cardiovascular disease, see there  system for advanced thin film deposition Placing thin films of material onto metal, ceramic or semiconductor substrates. See sputtering. . The IRad system is based on the robust, production-proven design of the TELFORMULA(TM) variable-load-size reactor.

Plasma-enhanced chemical vapor deposition (PECVD PECVD Plasma-Enhanced Chemical Vapor Deposition ) processes are typically performed in single-wafer reactors. IRad challenges conventional wisdom by incorporating a plasma source in the reaction chamber of a multi-wafer thermal CVD system. TEL's proprietary plasma source coupled with the unique design of the TELFORMULA process chamber produces excellent across-wafer and wafer-to-wafer film uniformity over a wide range of process conditions. This radically new concept provides significant productivity and cost-of-ownership advantages over conventional single-wafer PECVD.

IRad's in-situ plasma source allows film-forming chemical reactions to proceed at temperatures that are significantly lower than those required for thermal CVD. This directly addresses the low-temperature processing requirements of advanced logic and memory devices. The plasma also allows film chemical compositions to be varied over a very wide range. The resulting physical and electrical properties of the film can thus be precisely tailored to meet the requirements of 45nm devices and beyond. Furthermore, IRad's plasma capability can be combined with TEL's Molecular Layer Deposition (MLD MLD median lethal dose; minimum lethal dose.

MLD or mld
abbr.
minimal lethal dose


MLD,
n See dose, lethal, minimum.


MLD

minimum lethal dose.
) technology to produce highly conformal, nanometer-scale films and laminates. This unique process methodology enables development of a new class of materials for the nanotechnology era of device fabrication.

IRad is currently in production for molecular layer deposition of SiN and SiBN films. TEL is also currently working with leading logic and memory manufacturers to develop films targeted at the 45nm node and beyond.

About TEL

TEL, established in 1963, is a leading supplier of innovative semiconductor and FPD (1) (Flat Panel Display) See LCD, plasma display, EL display, FED and flat panel display.

(2) (Field Programmable Device) An umbrella term for all chips that can be programmed by the customer including SPLDs, CPLDs and FPGAs. See PLD.
 production equipment worldwide. In Japan, TEL also distributes computer network related products and electronic components of global leading suppliers. To support this diverse product base, TEL has strategically located around the world. TEL is a publicly held company listed on the Tokyo Stock Exchange Tokyo Stock Exchange

Main stock market of Japan, located in Tokyo. It opened in 1878 to provide a market for the trading of government bonds newly issued to former samurai.
. www.tel.com
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Publication:Business Wire
Date:Jul 7, 2005
Words:318
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