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Tokyo Electron, Sematech Partner on 3D Interconnect and High-Mobility Channel Materials.


Tokyo, Japan, Jan 26, 2007 - (JCN JCN Japan Corporate News
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) - Tokyo Electron Limited (TEL TEL Telephone
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) and Texas-based Sematech announced a multi-year joint development program aimed at improving the prospects for using 3D interconnect (1) To attach one device to another.

(2) A physical port (plug, socket) or wireless port (transmitter, receiver) used to attach one device to another.
 technology and high mobility channel materials in advanced semiconductor manufacturing.

These programs mark the beginning of a new collaboration Working together on a project. See collaborative software.  in which Sematech will partner with leading suppliers to address key technology challenges that are important to semiconductor customers. This offers suppliers lower R&D costs, accelerated results in technology development, and more efficient and effective technology implementation into leading-edge production fabs.

Under agreements involving an exchange of intellectual property and funding, Sematech and TEL engineers will collaborate on two separate projects, one a three-year effort to transcend the barriers to 3D processing in volume manufacturing, and the other a two-year project to advance the feasibility of using silicon-germanium in transistor gate stacks to increase processing speed See MHz. .

Copyright [c] 2007 Japan Corporate News Network. All rights reserved.
COPYRIGHT 2007 Japan Corporate News Network K.K.
No portion of this article can be reproduced without the express written permission from the copyright holder.
Copyright 2007, Gale Group. All rights reserved. Gale Group is a Thomson Corporation Company.

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Publication:JCNN News Summaries
Date:Feb 6, 2007
Words:154
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