Tevet Adoption Validates New Integrated Metrology Segment; Sensor-Based Technology Wins Reorders at High Volume Fabs with New Penetrations in Semiconductor Memory and Logic Manufacturers Worldwide.

YOKNEA'M, Israel -- Tevet Process Control Technologies today announced the achievement of sales and installed base milestones that score a clear breakthrough in acceptance by the semiconductor manufacturing industry. Tevet has now attained broad product penetration and won the key reorder and high volume fab proliferation that validates a new integrated metrology segment.

As of May 15, Tevet obtained sales from more than ten customers in all major worldwide regions. Tevet has established measurement-of-record (MOR) for CVD, PECVD, spin-on materials, and CMP on a wide range of both memory and logic products at top semiconductor manufacturers. In May, Tevet marks its latest proliferation milestone: 15 Trajectory T3 integrated metrology modules installed at the same fab site. High proliferation, with 15 or more Tevet integrated metrology systems per fab, has now been established at multiple fabs in the United States and in Asia. These milestones mark a crossover in acceptance for an emerging process control segment: sensor-based integrated metrology.

Tevet pioneered the new sensor-based integrated metrology market segment with its disruptive IsTMS (In-Situ Thickness Measurement System) technology. Tevet's Trajectory T3 film thickness integrated metrology module gives a 5:1 advantage in measurement speed, cost, and reliability vs. traditional integrated metrology. Tevet's patented technology enables customers to successfully and cost effectively deploy every-wafer monitoring on process tools where formerly it has been impossible due to throughput demands or negative ROI.

"Tevet's business model is based on providing enabling process control across the fab with inexpensive, highly capable and reliable, sensor-based integrated metrology," said Yuval Wasserman, CEO of Tevet Process Control Technologies. Tevet entered the market by targeting process steps that were unserved or underserved by existing metrology because of its inherent inability to measure fast enough or close enough to the process chamber. Tevet initially established itself on these HDP-CVD and PECVD steps and adoption is accelerating quickly and now fanning out to other processes as customers find out how Tevet can inexpensively provide multiple thicknesses monitoring of in-die features with no reliability risk or process throughput impact.

Tevet will be exhibiting its Trajectory T3 at SEMICON West 2006 tradeshow, 10-14 July, Esplanade booth 4523 at Moscone Center in San Francisco.

About Tevet-PCT: Tevet Process Control Technologies serves the semiconductor industry with unique integrated metrology solutions for critical process control challenges. Supporting customers worldwide, Tevet develops its technology and products in its headquarters in Israel and provides sales, marketing and technical support through its US offices. More information is available at www.tevet-pct.com.