Tencor Instruments Introduces Enhanced Software Interface for Its Film Measurement Systems; SUMMIT 1.1 provides Windows-based users additional functionality and increased productivity.MOUNTAIN VIEW, Calif.--(BUSINESS WIRE)--NOV. 13, 1996--Tencor Instruments (NASDAQ NASDAQ in full National Association of Securities Dealers Automated Quotations U.S. market for over-the-counter securities. Established in 1971 by the National Association of Securities Dealers (NASD), NASDAQ is an automated quotation system that reports on : TNCR TNCR Tennessee College Republicans ) today introduced SUMMIT version 1.1 software, designed to maximize functionality and productivity in Tencor's Prometrix thin film measurement systems, including the recently introduced UV-1270SE. The interface increases system productivity, particularly in challenging chemical-mechanical planarization Chemical-mechanical planarization or Chemical-mechanical polishing, commonly abbreviated CMP, is a technique used in semiconductor fabrication for planarizing the top surface of an in-process semiconductor wafer or other substrate. (CMP CMP (cytidine monophosphate): see cytosine. (1) (CMP Media LLC, Manhasset, NY, www.cmp.com) Part of United Business Media, CMP is a leading integrated media company that offers a wide variety of publications and services in the information ) applications. New features include enhanced simultaneous multilayer (ESML ESML - Extended Systems Modelling Language: a real-time software engineering methodology based on RTSA. ) measurements, improved pattern recognition, a new etch-to-clear algorithm and increased reliability. With its ESML measurement capability, the new SUMMIT software allows Tencor's measurement systems to calculate two film thicknesses, such as oxide and TiN, in roughly the same amount of time it takes to measure a single film thickness, or three film thicknesses, such as oxide-on-poly-on-oxide, in about the same length of time required for two thicknesses. This increases system throughput while providing better visibility into the process. Incorporating SUMMIT 1.1 into Tencor's thin film measurement systems also enables more rapid, accurate and reliable detection of pattern features, particularly in applications subject to wide variations such as CMP and etch To create a design in a material by digging out the material. The circuit designs on printed circuit boards and chips are etched by acid. See chip and printed circuit board. . This is due to the enhanced pattern recognition feature, which eliminates errors due to shadowing that can result from high-contrast films or saturation of the charge-coupled device See CCD. (electronics) charge-coupled device - (CCD) A semiconductor technology used to build light-sensitive electronic devices such as cameras and image scanners. CCDs can be made to detect either colour or black-and-white. (CCD CCD in full charge-coupled device Semiconductor device in which the individual semiconductor components are connected so that the electrical charge at the output of one device provides the input to the next device. ) camera. With the new etch-to-clear algorithm, which accurately determines the thickness of an oxide layer for all values down to zero thickness, users can characterize plasma-etched oxide on silicon to precisely determine etch uniformity and ensure surface integrity. SUMMIT substantially simplifies the operation of Tencor's thin film measurement systems and the creation of production tests. It includes production of two- and three-dimensional contour maps of film thickness, refractive index A property of a material that changes the speed of light, computed as the ratio of the speed of light in a vacuum to the speed of light through the material. When light travels at an angle between two different materials, their refractive indices determine the angle of transmission or extinction coefficient of any of the films in a complex film stack. It also simplifies process development and production line start-up by allowing users to mix and match recipes within a single cassette of wafers in batch tests. This is an essential feature required for fast, simple verification and qualification of production equipment. All tests can be run locally by operators, or remotely through a fully compliant generic equipment model (GEM) interface. Jose Estabil, Tencor senior product marketing manager, noted, "As the market leader in advanced film measurement systems, Tencor is dedicated to the continuous improvement of its products to meet customers' unique manufacturing demands. Offering an operator-friendly interface as a result of icon-based menus, recipe routines and wafer navigation, SUMMIT 1.1 software is the latest example of our commitment to providing technically superior, production-oriented tools that offer low cost of ownership and are backed by our high-quality technical support and customer service." In addition to the UV-1270SE, SUMMIT 1.1 software is compatible with the Prometrix UV-1070, UV-1250SE and UV-1050. Available immediately on all new Prometrix systems, the SUMMIT 1.1 software release can also be retrofitted to customers' existing Tencor thin film measurement products. About Tencor: Tencor Instruments, founded in 1976, is a recognized leader in the design and manufacture of innovative wafer defect inspection, software-based yield management, film measurement and metrology systems used in semiconductor manufacturing and related industries. Its Film Measurement division's product line has a worldwide installed base of over 2,500 systems. The company reported record revenues of $97 million for the quarter ended Sept. 30, 1996. Corporate offices are located in Mountain View and Santa Clara Santa Clara, city, Cuba Santa Clara (sän`tä klä`rä), city (1994 est. pop. 217,000), capital of Villa Clara prov., central Cuba. , Calif., with sales and service offices worldwide. The company's home page can be found on the World Wide Web at http://www.tencor.com CONTACT: Tencor Instruments Judy Dale, 408/970-9500 or MCA MCA in full Music Corporation of America Entertainment conglomerate. It was founded in Chicago in 1924 by Jules Stein as a talent agency. In the 1960s it bought Decca Records and Universal Pictures, and today it produces films, music, and television shows. , Inc. Vincent Mayeda, 415/968-8900 |
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