TSMC Selects Therma-Wave's Opti-Probe as Tool of Record for 193nm Film Metrology; Therma-Wave Opti-Probe Film Measurement System is Selected for Golden Tool Use at 193nm.Business Editors FREMONT, Calif.--(BUSINESS WIRE)--May 13, 2003 Therma-Wave, Inc. (Nasdaq:TWAVE), a worldwide leader in development, manufacture and sale of process control metrology systems used in the manufacture of semiconductors, today announced that Taiwan Semiconductor Manufacturing Company, Ltd., has chosen Therma-Wave's Opti-Probe Film Measurement System as its Tool of Record for 193 nanometer One billionth of a meter. Nanometers are used to measure the wavelengths of light. See angstrom and metric system. (nm) film metrology. TSMC TSMC Taiwan Semiconductor Manufacturing Company, Ltd TSMC Taiwan Semiconductor Manufacturing Corporation TSMC Traffic Systems Management Center TSMC Toll Station Management Controller TSMC Transportation Supply Maintenance Command TSMC Technical Services Manager Code will use the Opti-Probe in its manufacturing fabs to control the thickness and optical properties of the layered materials used to manufacture its most advanced IC's. The Opti-Probe was selected over competition based on its superior, multi-technology measurement capabilities, and in particular its tool-to-tool matching performance. Superior tool-to-tool matching enables TSMC to achieve tighter process control and consistent on-target performance from the wafer processing systems throughout the entire fab. Furthermore, at a higher level, it enables TSMC to link or "match" multiple fabs to the same "golden standard", thereby maximizing the predictability and flexibility of its manufacturing enterprise. The heart of the Opti-Probe's technology that enables it to provide the best matching capability is a Therma-Wave patented film metrology subsystem A unit or device that is part of a larger system. For example, a disk subsystem is a part of a computer system. A bus is a part of the computer. A subsystem usually refers to hardware, but it may be used to describe software. called "BPR (Business Process Reengineering) See reengineering. BPR - Business Process Re-engineering ," which stands for Beam Profile Reflectometry. This method employs a single-wavelength, sharply focused laser beam to illuminate il·lu·mi·nate v. il·lu·mi·nat·ed, il·lu·mi·nat·ing, il·lu·mi·nates v.tr. 1. To provide or brighten with light. 2. To decorate or hang with lights. 3. the wafer surface with a cone of light cone of light n. The bright triangular area of reflected light on the tympanic membrane during examination. Also called light reflex. . By measuring the reflectance re·flec·tance n. The ratio of the total amount of radiation, as of light, reflected by a surface to the total amount of radiation incident on the surface. Noun 1. of the laser light from the wafer, at each of the incident angles within the illumination illumination, in art illumination, in art, decoration of manuscripts and books with colored, gilded pictures, often referred to as miniatures (see miniature painting); historiated and decorated initials; and ornamental border designs. cone, the Opti-Probe is able to determine the thickness and optical properties of films on the wafer surface. Because BPR uses only one wavelength of light, it does not require complex information of the optical properties of each of the films over a broad range of wavelengths. This unique self-sufficiency enables BPR to act as a robust, cross-calibrating "anchor" for matching Opti-Probes together. "As the world's largest foundry, TSMC manufactures thousands of different IC devices for its customers. It is advantageous for our company to use metrology systems that can best help us control and simplify the foundry environment. Opti-Probe is very effective for us in this role," said Dr. Burn Lin, Senior Director of the Micropatterning Technology Division at TSMC. "Opti-Probe has five technologies in one tool, and all are matched together by Therma-Wave's calibration calibration /cal·i·bra·tion/ (kal?i-bra´shun) determination of the accuracy of an instrument, usually by measurement of its variation from a standard, to ascertain necessary correction factors. techniques with BPR as a foundation. This tool helps TSMC gain tight control of film thickness and optical properties, and achieve good matching, tool-to-tool and fab-to-fab," added Dr. Y.C.Ku, Department Manager for Advanced Lithography lithography (lĭthŏg`rəfē), type of planographic or surface printing. It is distinguished from letterpress (relief) printing and from intaglio printing (in which the design is cut or etched into the plate). in the Micropatterning Technology Division at TSMC. Opti-Probe Film Measurement System a technology-leading Film Thickness Metrology System employing multiple measurement technologies integrated in one tool for unsurpassed breadth of applications, flexibility and cost-effectiveness for semiconductor manufacturing. Over 1200 Opti-Probe Film Measurement Systems are in use by semiconductor manufacturers throughout the world, including a large number at major 300mm, high-volume production fabs. About Therma-Wave, Inc. Since 1982, Therma-Wave, Inc., has been revolutionizing process control metrology systems through innovative proprietary products and technologies. The company is a worldwide leader in the development, manufacture, marketing and service of process control metrology systems used in the manufacture of semiconductors. Therma-Wave currently offers leading-edge products to the semiconductor manufacturing industry for the measurement of transparent, semi-transparent, and opaque thin films; for the measurement of critical dimensions and profile of IC features; for the monitoring of ion implantation Ion implantation A process that utilizes accelerated ions to penetrate a solid surface. The implanted ions can be used to modify the surface composition, structure, or property of the solid material. ; and for the integration of metrology into semiconductor processing systems. For further information about Therma-Wave, Inc., access the web site at: http://www.thermawave.com. This press release contains forward-looking statements forward-looking statement A projected financial statement based on management expectations. A forward-looking statement involves risks with regard to the accuracy of assumptions underlying the projections. as that term is defined in the Private Securities Reform Act of 1995, which are subject to known and unknown risks and uncertainties that could cause actual results to differ materially from those expressed or implied by such statements. Such statements, particularly those discussing the customer's use of the Opti-Probe in its manufacturing fabs to control the thickness and optical properties of the layered materials used to manufacture its most advanced IC's, are based on current expectations. Such statements are subject to risks, uncertainties and changes in condition, particularly those related to industry requirements and other risks, some of which are detailed in documents filed with the Securities and Exchange Commission including specifically Exhibit 99.1 to the Company's annual report on Form 10-K Form 10-K A report required by the SEC from exchange-listed companies that provides for annual disclosure of certain financial information. Form 10-K See 10-K. and Form 10-K/A for the year ended March 31, 2002 and subsequent Forms 10-Q and 10-Q/A. The Company undertakes no obligation to update the information in this press release. |
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