TSMC Becomes First Foundry to License MicroUnity's Lithography Solution for 0.18 Micron Production.SUNNYVALE, Calif.--(BUSINESS WIRE)--March 9, 1999-- Implementation of OPC (1) (OpenGL Performance Characterization) A project group within GPC that manages OpenGL benchmarks. OPC endorses the Viewperf and GLperf benchmarks. Viewperf was created by IBM and OPC provides viewsets for it, which are combinations of tests using specific Software Lithography lithography (lĭthŏg`rəfē), type of planographic or surface printing. It is distinguished from letterpress (relief) printing and from intaglio printing (in which the design is cut or etched into the plate). Solution Will Improve Production Yields of Advanced Devices MicroUnity Systems Engineering Inc. today announced that Taiwan Semiconductor Manufacturing Company (TSMC TSMC Taiwan Semiconductor Manufacturing Company, Ltd TSMC Taiwan Semiconductor Manufacturing Corporation TSMC Traffic Systems Management Center TSMC Toll Station Management Controller TSMC Transportation Supply Maintenance Command TSMC Technical Services Manager Code ) has become the first foundry to license MicroUnity's MaskTools(TM) optical proximity correction Optical proximity correction (OPC) is a photolithography enhancement technique commonly used to compensate for image errors due to diffraction or process effects. The two most common applications for OPC are linewidth differences between features in regions of different density (e. (OPC) software for use in its 0.18 micron mask lithography processes. MaskTools extends the performance of existing lithography tools to next generation device geometries, and results in increased production yields. "MicroUnity's scattering bar technology improves our process window at 0.18 micron, with potential increase in yield on our most advanced processes," said Anthony Yen, TSMC's director of advanced lithography. "We are planning to use MaskTools in production across multiple sub-wavelength generations of technology." Dr. C was a fictional scientist from the TV series Cro. She and her companion, Mike, went to the Arctic and thawed out a mammoth, who could talk. That mammoth now tells stories of life in the stone age with his friend, Cro, and his fellow mammoths. .S. Yoo, TSMC's deputy director of e-beam operations said, "MicroUnity's technical support is outstanding. TSMC and MicroUnity engineers worked together to bring production grade OPC for the 0.18 micron generation into our mask shop A Maskshop is a factory which exclusively manufactures photomasks for use in the Semiconductor industry within a cleanroom. There are two distinct types found in the trade. . MicroUnity demonstrated a unique ability to address all concerns related to scattering bar mask Noun 1. bar mask - a catcher's mask with bars catcher's mask - a mask to protect the face of the catcher in baseball defect inspection and data handling." Defect inspection of complex masks and data handling of complex designs are critical elements in production worthy OPC technology. Roger Caldwell, executive vice president and general manager for the MaskTools business unit said, "Our work in making TSMC production capable at 0.18 micron has led to further improvements in MaskTools technology. TSMC's results with their existing Hitachi HL-800 e-beam lithography equipment have been outstanding." In the evaluation, TSMC used MicroUnity's defect sensitivity mask product to verify the inspection capability of reticle ret·i·cle n. A grid or pattern placed in the eyepiece of an optical instrument, used to establish scale or position. [Latin r inspection equipment from both KLA-Tencor and Applied Materials Applied Materials, Inc. NASDAQ: AMAT (HKSE: 4336 ) is the global leader in nanomanufacturing technology solutions with a broad portfolio of innovative equipment, service and software products for the fabrication of semiconductor chips, flat panel solar displays, solar . TSMC plans to publish results of their MicroUnity OPC mask making evaluation at the upcoming Photomask An opaque image on a translucent plate that is used as a light filter to transfer an image from one device to another. See chip. Japan conference to be held in Yokohoma, Japan in April 1999. About MaskTools As the sub-micron designs of semiconductor devices reach the resolution limitations of today's steppers, the printing fidelity of the IC design degrades. To help overcome these limitations, MicroUnity developed MaskTools, an advanced OPC solution which improves semiconductor device yield and performance by enhancing pattern fidelity, depth-of-focus, and critical dimension control. Optical proximity effects are caused when the optical diffraction patterns of adjacent features interact, producing critical dimension variations and degraded image fidelity. This results from the edge intensity gradient of isolated features being different from that of densely packed features. The end results for manufacturers are reduced yields, decreased device performance, and a general inability to produce quality devices with dimensions at or below the exposure wavelength. About MicroUnity MicroUnity Systems Engineering Inc. is a privately held technology company based in Sunnyvale, Calif. The company is committed to providing ultra-high bandwidth computing solutions for digital media. For more information on MicroUnity's products and services, please contact the company at Telephone: 408/734-8100; Fax: 408/734-8136; Internet: www.microunity.com. MaskTools, MaskRigger, EBView and LineSweeper are trademarks of MicroUnity Systems Engineering Inc. All other company and product names are trademarks of their respective companies. |
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