TEL to Begin Taking Orders for the Vesta, Its Next-Generation 300mm Process Etching Chamber.Business Editors/High-Tech Writers TOKYO--(BUSINESS WIRE)--Nov. 13, 2003 Tokyo Electron Limited (TEL TEL Telephone TEL Telegram TEL Telugu (langauge) TEL Terrorist Exclusion List TEL Technology-Enhanced Learning TEL Transporter-Erector-Launcher TEL Tetra-Ethyl Lead TEL Team Deutsche Telekom ; Head Office: Minato-ku, Tokyo; President & CEO (1) (Chief Executive Officer) The highest individual in command of an organization. Typically the president of the company, the CEO reports to the Chairman of the Board. : Kiyoshi Sato) announced today that it will begin accepting orders for the Vesta(tm), its new 300mm wafer process etching chamber, beginning in April 2004. The Vesta can be built into TEL's Telius(tm) platform, which has a strong production track record and a large share of the global market for 300mm semiconductor production. It supports next-generation micro-fabrication technologies of 65nm-45nm and smaller, which enables enhanced productivity. The Vesta is based on high-frequency RF delivered to a parallel plate configuration, which improves the controllability of plasma density and dissociation. Another new development in the Vesta chamber is Independent Distribution Control (IDC), which is designed to improve control of wafer surface uniformity. The Vesta is equipped with two kinds of IDC: Plasma Distribution Control (PDC (1) (Primary Domain Controller) A Windows NT/2000 service that manages security for its local domain. Every domain has one PDC, which contains a database of usernames, passwords and permissions. ), capable of controlling the density of plasma electrons, and Radical Distribution Control (RDC RDC Republique Democratique du Congo (French) RDC Rez de Chaussee (French: Ground Floor) RDC Red Deer College RDC Remote Desktop Connection (Microsoft) RDC Rowan Companies, Inc ), capable of controlling radical density. By offering these new, cutting-edge features, the Vesta achieves further improvements in CD uniformity and reproducibility out to the wafer edge. The chamber provides a wide process window for low-k films, such as SiCOH and organically based films, which are expected to be used in many next-generation electronic devices. The Vesta also provides high etch rates and selectivity necessary for advanced manufacturing. TEL will continue to meet the needs of increasingly diverse etching applications, including high aspect ratio contact, Dual Damascene, poly gate and shallow trench. About TEL TEL, commemorating its 40-year anniversary this month, is a leading supplier of innovative semiconductor and FPD (1) (Flat Panel Display) See LCD, plasma display, EL display, FED and flat panel display. (2) (Field Programmable Device) An umbrella term for all chips that can be programmed by the customer including SPLDs, CPLDs and FPGAs. See PLD. production equipment worldwide. Product lines include coater/developers, thermal processing systems, dry etchers, CVD CVD Cardiovascular disease, see there systems, wet cleaning  This article or section needs copy editing for grammar, style, cohesion, tone and/or spelling.You can assist by [ editing it] now. systems and test systems. In Japan, TEL distributes other leading-edge semiconductor equipment tools, such as metrology tools or process control systems. In addition, TEL distributes high quality computer systems, semiconductor devices and electronic components of other leading suppliers, as well as computer network-related products from around the world. To support this diverse product base, TEL has strategically located research & development, manufacturing, sales, and service locations all over the world. TEL is a publicly held company listed on the Tokyo Stock Exchange Tokyo Stock Exchange Main stock market of Japan, located in Tokyo. It opened in 1878 to provide a market for the trading of government bonds newly issued to former samurai. . http://www.tel.com |
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