TEL Releases Photomask Resist Coater/Developer, CLEAN TRACK ACT M, for 90 - 65nm Device Technology Nodes.Business Editors/High-Tech Writers TOKYO--(BUSINESS WIRE)--April 7, 2004 Tokyo Electron (TEL TEL Telephone TEL Telegram TEL Telugu (langauge) TEL Terrorist Exclusion List TEL Technology-Enhanced Learning TEL Transporter-Erector-Launcher TEL Tetra-Ethyl Lead TEL Team Deutsche Telekom ), announced Wednesday that it will begin accepting orders for the CLEAN TRACK ACT(R) M (Mask), a high performance photomask resist coater/developer targeted for 90-65nm technology nodes. The products are based on three separate high performance application modules, including a photomask developer, photomask resist coater, and photomask PEB PEB Physical Evaluation Board PEB Presidential Emergency Board PEB Post Exposure Bake PEB Professional Engineers Board (Singapore) PEB Pre-Engineered Building PEB Personal Electronic Ballot PEB Performance Evaluation Board (Post Exposure Bake) baker. Due to increased complexities such as OPC (Optical Proximity Correction Optical proximity correction (OPC) is a photolithography enhancement technique commonly used to compensate for image errors due to diffraction or process effects. The two most common applications for OPC are linewidth differences between features in regions of different density (e. ), phase shifting, and use of chemically amplified resists, more advanced processing control and techniques are required to manufacture photomasks for the finer technology nodes. The CLEAN TRACK ACT M is based on TEL's market-dominating CLEAN TRACK ACT platform and their many years of semiconductor wafer and flat panel display A thin display screen for computer and TV usage. The first flat panels appeared on laptop computers in the mid-1980s, and the LCD technology became the standard. Stand-alone LCD screens became available for desktop computers in the mid-1990s and exceeded sales of CRTs for the first time resist coating/development experience. With more than 2,000 systems installed worldwide, the ACT system is well known for its advanced process technologies and high reliability. CLEAN TRACK ACT M is designed for photomask (6025 Substrate) processing for the 90-65nm device nodes. The individual photomask developer, resist coater and baker modules can be configured into one system. With the CLEAN TRACK ACT M, TEL has improved within-mask and mask-to-mask process uniformity while reducing defects. TEL plans to deliver 20 systems in the first year of the product's release. About TEL TEL (Head Office: Minato-ku, Tokyo; President & CEO (1) (Chief Executive Officer) The highest individual in command of an organization. Typically the president of the company, the CEO reports to the Chairman of the Board. : Kiyoshi Sato), established in 1963, is a leading supplier of innovative semiconductor and FPD production equipment worldwide. In Japan, TEL also distributes computer network related products and electronic components of global leading suppliers. To support this diverse product base, TEL has strategically located around the world. TEL is a publicly held company listed on the Tokyo Stock Exchange Tokyo Stock Exchange Main stock market of Japan, located in Tokyo. It opened in 1878 to provide a market for the trading of government bonds newly issued to former samurai. . http://www.tel.com |
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