Silicon Genesis earns dry cleaning patent. (Patent Review).* Patent No. US 6,500,260 B1: Silicon Genesis Corporation, San Jose San Jose, city, United States San Jose (sănəzā`, săn hōzā`), city (1990 pop. 782,248), seat of Santa Clara co., W central Calif.; founded 1777, inc. 1850. , CA, patented a method of cleaning objects comprising a vacuum chamber, high energy photon from a light source and a collector One side of a bipolar transistor. When the base is pulsed, current flows from the emitter to the collector, or vice versa depending on the design. See drain. substrate The base layer of a structure such as a chip, multichip module (MCM), printed circuit board or disk platter. Silicon is the most widely used substrate for chips. Fiberglass (FR4) is mostly used for printed circuit boards, and ceramic is used for MCMs. . |
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