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Sharp to Construct Non-dilution Wastewater Treatment Facility for Its Semiconductor Plant.


Tokyo, Japan, May 26, 2006 - (JCN JCN Japan Corporate News
JCN Journal of Cognitive Neuroscience
JCN Journal of Cardiovascular Nursing
JCN Journal of Christian Nursing
JCN Job Control Number
JCN Journal of Child Neurology
JCN joint communications network (US DoD) 
) - Sharp will construct a new wastewater treatment facility in its Fukuyama semiconductor plant in Hiroshima.

To be built with an investment of 440 million yen ($4.0 mil An Internet address domain name for a military agency. See Internet address.

(networking) mil - The top-level domain for entities affiliated with US armed forces.
), the plant will be completed in June and will go into operation in July

The new facility, which combines a micro-nano-bubble technology with its proprietary microorganism microorganism /mi·cro·or·gan·ism/ (-or´gah-nizm) a microscopic organism; those of medical interest include bacteria, fungi, and protozoa.  treatment technique, can remove 90% of nitrogen from wastewater without dilution Dilution

A reduction in earnings per share of common stock that occurs through the issuance of additional shares or the conversion of convertible securities.

Notes:
Adding to the number of shares outstanding reduces the value of holdings of existing shareholders.
. The new facility will have a daily processing capacity of 160m3.

Copyright [c] 2006 Japan Corporate News Network. All rights reserved.
COPYRIGHT 2006 Japan Corporate News Network K.K.
No portion of this article can be reproduced without the express written permission from the copyright holder.
Copyright 2006, Gale Group. All rights reserved. Gale Group is a Thomson Corporation Company.

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Publication:JCNN News Summaries
Date:May 29, 2006
Words:92
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