Printer Friendly
The Free Library
14,508,224 articles and books
Member login
User name  
Password 
 
Join us Forgot password?

Semiconductor devices transfer like decals.


Semiconductor devices transfer like decals

Lots of kids master the childhood technology known by some as Silly Putty Silly Putty

synthetic clay; uses ranging from bouncing balls to false mustaches. [Am. Hist.: Sann, 165]

See : Fads
 transfer. By pressing Silly Putty on a newspaper comic, kids lift off ink images and transfer them to, say, the kitchen table. Now scientists report using a related method for transferring ultrathin ul·tra·thin  
adj.
Very thin.
 semiconductor devices from one place to another. Faster computers, new opto-electronic devices and cheaper solar cells are some of the expected payoffs, the researchers say.

Compared to silicon, the newer semiconductor material gallium arsenide An alloy of gallium and arsenic compound (GaAs) that is used as the base material for chips. Several times faster than silicon, it is used in high frequency applications such as cellphones, DVD players and fiber optics.  makes for faster transistors. And unlike silicon, its crystals can turn laser light into electronic signals or vice versa VICE VERSA. On the contrary; on opposite sides. . But because the two materials clash crystally, gallium arsenide resists growing on silicon to make hybrid opto-electronic devices.

The new material-saving technique called epitaxial liftoff may solve these problems, say researchers at Bell Communications Research (Bellcore), in Red Bank, N.J. "This will hasten the day when the world of optical fiber communications comes all the way into homes," predicts physicist Eli Yablonovitch Eli Yablonovitch along with Sajeev John, was one of the two physicists who invented the field of photonic crystals in 1987. In addition to pioneering photonic crystals, he was the first to recognize that a strained quantum well laser has a significantly reduced threshold current , leader of the research team. In the February PHOTONICS TECNOLOGY LETTERS, the researchers report using the technique for transferring preformed thin film lasers onto glass from a gallium arsenide template, or substrate, on which they are grown.

Making gallium arsenide devices involves wafers about 0.5 mm thick, yet only the very top microns (0.001 mm) participate in the devices' actions, he says. "Well over 90 percent of the semiconductor chip is just there to mechanically support the active layer, which is incredibly thin," says Yablonovitch. "By separating the part that does the work from the part that supports it, we overcome a lot of problems." These include the substrate's inability to combine with other materials such as silicon and its poor thermal conductivity, which limits its uses to those that don't produce much heat.

Starting with a thick gallium arsenide growth substrate, the researchers successively deposit thin layers of semi- and less-conductive materials to construct devices such as transistors and lasers. First, directly on the substrate, the researchers lay down a roughly seven-atom-deep dissolvable film of aluminum arsenide ar·se·nide  
n.
A compound of arsenic with a more electropositive element.

Noun 1. arsenide - a compound of arsenic with a more positive element
. Next comes the thin laser assembly: A layer of semiconductive gallium arsenide underlies four more layers that alternate between less-conductive gallium gallium (găl`ēəm), metallic chemical element; symbol Ga; at. no. 31; at. wt. 69.72; m.p. 29.78°C;; b.p. 2,403°C;; sp. gr. 5.904 at 29.6°C; (solid), 6.095 at 29.8°C; (liquid); valence +2 or +3.  aluminum arsenide and gallium arsenide. The middle gallium arsenide layer responds to electronic currents between the uppermost and bottommost layers of the material by emitting laser light. A layer of mechanically supportive wax tops it all off.

Treatment with hydrofluoric acid hydrofluoric acid /hy·dro·flu·o·ric ac·id/ (-floor´ik) a gaseous haloid acid, HF, extremely poisonous and corrosive.
hydrofluoric acid,
n a compound consisting of hydrogen and flourine.
, which eats through the aluminum arsenide separation layer while leaving everything else unscathed, frees the thin-layer laser from the now reusable substrate. The laser is then easily transferred to any smooth surface such as glass or polished silicon, Yablonovitch says. Once it's there, a solvent washes away the wax.

Using epitaxial liftoff to make hybrid devices that combine silicon-based chips with the optical capabilities of gallium arsenide is "the hope of the future," comments Paul S. Peercy, manager of compound semiconductor and device research at Sandia national Laboratories Sandia National Laboratories, which is managed and operated by the Sandia Corporation (a wholly owned subsidiary of Lockheed Martin Corporation), is a major United States Department of Energy research and development national laboratory with two locations, one in Albuquerque, New  in Albuquerque, N.M.
COPYRIGHT 1989 Science Service, Inc.
No portion of this article can be reproduced without the express written permission from the copyright holder.
Copyright 1989, Gale Group. All rights reserved. Gale Group is a Thomson Corporation Company.

 Reader Opinion

Title:

Comment:



 

Article Details
Printer friendly Cite/link Email Feedback
Title Annotation:epitaxial liftoff
Author:Amato, Ivan
Publication:Science News
Date:Feb 18, 1989
Words:500
Previous Article:Stone blades yield early cultivation clues.
Next Article:Antifreezes in fish work quite similarly.
Topics:



Related Articles
Mattson Technology Appoints Two New Vice Presidents.
A T M I's Epitronics Business Selected as Raytheon Primary Supplier.
EMCORE Enters Into Agreement with Motorola on Wireless Electronic Materials Technology.
A T M I Expands Specialty Silicon Epitaxy Capacity by 25%; Strong Analog and Wireless Demand Requires Significant Expansion at Epitronics Unit.
EMCORE Enters Into Agreement with Motorola on Wireless Electronic Materials Technology.
NIST leads industry round-robin of photonic semiconductor characterization. (News Briefs).(National Institute of Standards and Technology)(Brief...
Veeco Launches Epitaxial Process Integration Center.
IBM paves way for higher performing, lower power electronic devices develops innovative methods to make high mobility transistors.
Toshiba Announces Gallium Nitride Power FET With World's Highest Power Output; Achievement of 174W Output Power at 6GHz will Support Enhanced...
Showa Denko Develops New Crystal Growth Technology for GaN-based Blue/White LEDs.

Terms of use | Copyright © 2009 Farlex, Inc. | Feedback | For webmasters | Submit articles