STMicroelectronics Processes One Million Wafers Using FSI International's Ozone Strip Technology.

Business Editors

MINNEAPOLIS--(BUSINESS WIRE)--Oct. 4, 2000

FSI International has become a significant contributor to STMicroelectronics' drive to make sustainable, environmentally conscious semiconductor manufacturing development part of its corporate mission. Since adopting DIO3- (ozonated water) based resist strip processing for front-end-of-line (FEOL) production in February, ST has processed one million wafers using the FSI technology in its AG1ST,Agrate, Italy, facility.

Four of FSI's spray processing systems installed at ST are equipped with DIO3 Generation Modules. This technology has allowed ST to convert from its use of conventional piranha-based chemistry to the more benign DIO3 chemistry in almost all FEOL resist stripping and post-ash residue removal steps, nearly eliminating the use of sulfuric acid (H2SO4) and significantly reducing the use of hydrogen peroxide (H2O2).

"Our goal is to become as environmentally neutral as possible," said Corrado Mavero, Process Engineering Manager of AG1ST, STMicroelectronics. "An important part of this goal is a commitment to reduce the consumption of chemicals used in the semiconductor production process. The use of FSI's DIO3 process saved 24,000 litres of sulfuric acid to date." Unlike DIO3, piranha chemistry also requires costly, complex waste treatment measures and imposes a greater burden on the environment.

"FSI is proud to be a partner with ST in this vital environmental initiative," said John Ely, president of FSI's Surface Conditioning Division . "We are committed to being a provider of environmental, safety and health (ES&H) solutions to the entire industry and actively participate in SEMI(R)'s Global Care(TM) initiative. It is rewarding to see strong response from semiconductor manufacturers such as ST. Along with Metron Technology, our European distributor, FSI continues to develop DIO3 technology and other alternative chemistries so companies can extend ES&H benefits."

FSI's DIO3 Generation Module is custom designed to supply MERCURY(R) or ZETA(R) Surface Conditioning Systems with ozonated water (DIO3) for wafer cleaning and photoresist stripping/cleaning applications.

STMicroelectronics is a global independent semiconductor company that designs, develops, manufactures and markets a broad range of semiconductor integrated circuits (ICs) and discrete devices used in a wide variety of microelectronic applications, including telecommunications systems, computer systems, consumer products, automotive products and industrial automation and control systems.

Metron Technology (MTCH) is a leading global provider of outsourced marketing, sales, service and support solutions to semiconductor materials and equipment suppliers and semiconductor manufacturers. Metron has the ability to provide product service and support in major semiconductor manufacturing markets in the world.

FSI International, Inc. is a leading global supplier of processing equipment used at key production steps to manufacture microelectronics. The company develops, manufactures, markets and supports products used in the technology areas of microlithography, surface conditioning and low-k spin-on dielectrics. FSI International's customers include microelectronics manufacturers located throughout North America, Europe, Japan and the Asia-Pacific region.

Additional information on FSI International can be obtained by accessing its homepage at http://www.fsi-intl.com. STMicroelectronics' homepage is http://www.eu.st.com. Metron Technology can be accessed at http://www.metrontech.com.