SIGMA-C Announces Updated Process Window Analyzer Software; PWA 2.0 Upgraded to Boost Productivity.Business Editors/High-Tech Writers MUNICH, Germany--(BUSINESS WIRE)--April 5, 2004 SIGMA-C GmbH, a leading provider of applied simulation software Simulation software is based on the process of imitating a real phenomenon with a set of mathematical formulas. It is, essentially, a program that allows the user to observe an operation through simulation without actually running the program. for the semiconductor industry, recently released PWA PWA abbr. 1. person with AIDS 2. Public Works Administration 2.0, an upgraded version of its Process Window Analyzer (PWA) software. SIGMA-C's versatile PWA program determines the largest usable process window by importing and plotting focus-exposure matrices directly from a CD-SEM CD-SEM Critical Dimension - Scanning Electron Microscopy in conjunction with fast computation of the process window and powerful reporting. With dramatically faster computation abilities, PWA 2.0 improves upon the original PWA features to include calculations of an elliptical el·lip·tic or el·lip·ti·cal adj. 1. Of, relating to, or having the shape of an ellipse. 2. Containing or characterized by ellipsis. 3. a. process window, which offers a more accurate analysis. PWA 2.0 is currently available for distribution. SIGMA-C's new analysis tool quickly calculates data and draws conclusions for excursion control and trend documentation in semiconductor manufacturing as part of statistical process control (SPC 1. (business) SPC - Statistical Process Control. Something to do with quality management. 2. (body) SPC - Software Productivity Centre. 3. (company) SPC - Software Publishing Corporation. 4. ). Other updates include improved interfaces to CD-SEMs and day-to-day report printing which enables better feedback. With heightened critical dimension (CD) control, PWA 2.0 will minimize yield loss risks. The software's new features provide greater measuring, processing and reporting tools in order to more accurately and effectively compute data. Elliptical process windows provide a better description of what happens due to variations in parameters. The current rectangular process window assumes the parameters affecting exposure/focus fluctuations are coupled. However, SIGMA-C realizes that the more accurate assumption is that these parameters are statistically independent. Consequently, in PWA 2.0, the elliptical process window was implemented to more accurately reflect reality. "Leveraging years of experience as a leading provider of applied simulation software, SIGMA-C is committed to improving excursion control through our analysis software in order to significantly reduce yield loss," said Uli Hofmann, director of technical marketing. "We are constantly looking for Looking for In the context of general equities, this describing a buy interest in which a dealer is asked to offer stock, often involving a capital commitment. Antithesis of in touch with. new ways to strengthen the predictive analysis capabilities of our software for statistical process control, which will dramatically increase throughput and improve our customer's ROI (Return On Investment) The monetary benefits derived from having spent money on developing or revising a system. In the IT world, there are more ways to compute ROI than Carter has liver pills (and for those of you who never heard of that expression, it means a lot). (return on investment)." About SIGMA-C GmbH SIGMA-C is a leading provider of applied simulation software that models semiconductor fabrication fabrication (fab´rikā´sh  n),n the construction or making of a restoration. from design to manufacture. SIGMA-C's product portfolio includes engineering tools, such as optical lithography simulation software, as well as production tools for full-chip data preparation, e-beam lithography, optical proximity correction Optical proximity correction (OPC) is a photolithography enhancement technique commonly used to compensate for image errors due to diffraction or process effects. The two most common applications for OPC are linewidth differences between features in regions of different density (e. and data analysis. The company's advanced simulation software allows users to optimize processes prior to actual production. This can significantly improve product yields, cycle times and equipment utilization rates. All leading-edge semiconductor manufacturers use SIGMA-C's tools. Founded in 1987, SIGMA-C is headquartered in Munich, Germany with a U.S. subsidiary in Campbell, Calif. The company maintains a Web site at www.sigma-c.com. |
|
||||||||||||||||
Printer friendly
Cite/link
Email
Feedback
Reader Opinion