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SEMICONDUCTOR CHARACTERIZATION AND METROLOGY CONFERENCE AT NIST.

The 2000 International Conference on Characterization and Metrology for Ultra Large Scale Integration (ULSI) Technology was hosted by NIST in June 2000. The conference is the third in a series; the first was held at NIST in 1995 and the second in 1998. The 2000 conference was highly successful, bringing in more than 220 attendees from the United States, the Netherlands, Belgium, France, Spain, Germany, Switzerland, Israel, Korea, China, Japan, and Taiwan. Forty invited talks were presented, nearly 100 poster papers were displayed, and a panel was hosted to summarize key issues emerging from the conference.

Under NIST leadership, the conference was organized to provide extensive coverage of metrology and characterization methods. Perspectives on industrial metrology requirements were highlighted as well as a review of the 1999 International Technology Roadmap for Semiconductors as a benchmark for characterization and metrology needs. Topics for the conference included challenges, front-end processing, contamination and defect analysis, lithography, interconnect and backend processing, thin films, and critical analytical techniques.

The conference proceedings will be available in the spring of 2001. Orders may be placed on-line at www.aip. org/catalog/cpreq_form.html. Additionally, many of the talks will be made available for viewing on the conference web site at www.eeel.nist.gov/812/conference, as well as an ongoing dialogue about issues posed by the panel.
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Publication:Journal of Research of the National Institute of Standards and Technology
Date:Sep 1, 2000
Words:222
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