Rudolph Announces New S3000 and S2000 Metrology Tools; Ellipsometry-Based System Offers Optimized Price and Performance for Fab-Wide Transparent Film Applications.

FLANDERS, N.J. -- Rudolph Technologies, Inc. (NASDAQ:RTEC), a worldwide leader in high-performance process control metrology, defect inspection and data analysis for semiconductor manufacturing, announced today its new S3000(TM) and S2000(TM) ellipsometry-based metrology systems designed to provide high throughput, cost-effective measurements of thin transparent films throughout the device fabrication process. The S3000 (300 mm) and S2000 (200 mm) are engineered to provide ellipsometry at optimized price and performance for transparent film metrology applications in the thin film, CMP, etch and lithography modules. Rudolph pioneered FOCUS(TM) beam ellipsometry for thin film metrology--its ultra-II(TM) offers the accuracy and repeatability required for the most demanding front-end diffusion processes.

"We believe these systems provide a value-engineered solution that exceeds the metrology requirements for the majority of transparent film processes outside the diffusion area," said Chris Morath, director of metrology product management at Rudolph. "The S3000/2000 is designed to deliver these benefits at a lower price than instruments developed to meet performance requirements for extreme diffusion applications, such as ultra-thin gates. This robust process solution should directly contribute to improved profitability for our customers."

The S3000/2000 systems use Rudolph's fifth-generation FOCUS beam ellipsometry, incorporating long-life laser light sources for high accuracy, long-term stability, small spot size and easy tool-to-tool matching. The systems also provide optional deep UV and visible reflectometry capabilities to flexibly address a broad range of applications throughout the fab.

Built on Rudolph's established Vanguard(TM) platform, the S3000/2000 incorporate an easy-to-use Microsoft Windows XP(R) based interface. Rudolph-proprietary geometric pattern-matching technology provides superb robustness for patterned wafer applications in the etch and CMP modules with low image contrast or a large degree of color variation. For additional cost savings, optional integrated stress/bow measurements eliminate the need for a separate instrument.

The S3000/2000 systems are available immediately for shipment.

Safe Harbor Statement

This press release contains forward-looking statements within the meaning of the Private Securities Litigation Reform Act of 1995 (the "Act"). In some cases, you can identify those so-called "forward-looking statements" by words such as "may," "will," "would," "should," "expects," "plans," "anticipates," "believes," "feels," "estimates," "predicts," "potential," or "continue," or the negative of those words and other comparable words. Rudolph wishes to take advantage of the "safe harbor" provided for by the Act and cautions that actual results may differ materially from those projected as a result of various factors, including risks and uncertainties, many of which are beyond Rudolph's control. Factors that could cause actual results to differ materially from the expectations expressed in such forward-looking statements, include, but are not limited to, the impact of the slowdown in the overall economy, the uncertainty of the current global political environment, the potential for terrorist attacks, the potential for business disruptions due to infectious diseases, changes in customer demands for our existing and new products, the timing, cancellation or delay of customer orders and shipments, the timing of revenue recognition of shipments, new product offerings from our competitors, changes in or an inability to execute Rudolph's business strategy, unanticipated manufacturing or supply problems and changes in tax rules. Rudolph cannot guarantee future results, levels of activity, performance, or achievements. The matters discussed in this press release also involve risks and uncertainties as summarized in Rudolph's Form 10-K report for the year ended December 31, 2005 and other filings with the Securities and Exchange Commission ("SEC"), which are available at http://www.sec.gov, the SEC's website, and at http://www.rudolphtech.com, the Rudolph website. While these factors may be updated from time to time through the filing of reports and registration statements with the SEC, Rudolph does not assume any obligation to update the forward-looking information contained in this press release.

About Rudolph Technologies, Inc.

Rudolph Technologies is a worldwide leader in the design, development, manufacture and support of high-performance process control metrology, defect inspection and data analysis systems used by semiconductor device manufacturers. Rudolph provides a full-fab solution through its families of proprietary products that provide critical yield-enhancing information, enabling microelectronic device manufacturers to drive down costs and time to market. The company has enhanced the competitiveness of its products in the marketplace by anticipating and addressing many emerging trends driving the semiconductor industry's growth. Rudolph's strategy for continued technological and market leadership includes aggressive research and development of complementary metrology and inspection solutions. Headquartered in Flanders, New Jersey, Rudolph supports its customers with a worldwide sales and service organization. Additional information can be found on the company's web site at www.rudolphtech.com.