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ROCKWELL LAUNCHES ELECTRON BEAM LITHOGRAPHIC SERVICES.


Rockwell Scientific Company LLC (Logical Link Control) See "LANs" under data link protocol.

LLC - Logical Link Control
 (RSC RSC Royal Society of Chemistry (UK)
RSC Royal Shakespeare Company
RSC Responsabilidad Social Corporativa (Spanish: corporate social responsibility)
RSC Royal Society of Canada
), Thousand Oaks, Calif., has introduced state-of-the-art, direct write Electron Beam Lithographic lith·o·graph  
n.
A print produced by lithography.

tr.v. lith·o·graphed, lith·o·graph·ing, lith·o·graphs
To produce by lithography.
 (EBL) services. The services are supported by RSC's new JEOL JEOL Japan Electron Optics Laboratory  JBX 6000FS/E machine, which has 20 nm minimum line width for standard services. Custom services are available for line widths smaller than 20 nm. The company offers capabilities that can satisfy the most stringent technical requirements with rapid turnaround.

RSC's Electron Beam Lithography Using electron beams to create the mask patterns directly on a chip. The wavelength of an electron beam is only a few picometers compared to the 248 to 365 nanometer wavelengths of light used to create the traditional photomasks.  Team is staffed by highly trained professionals with decades of experience covering a wide range of EBL applications. They are knowledgeable on all major EBL hardware and software. In particular, the team is very familiar with the two major EBL tools, JEOL and Leica, and is capable of resolving issues of interchangeability of jobs between the two tools.

Specific EBL services include the following:

-- Direct writing onto Si, GaAs, InP, SiC and GaN substrates of sizes ranging from pieces of wafers to full 4-inch wafers. Six-inch wafer capability is available as a custom service.

-- Writing FET FET: see transistor.


(Field Effect Transistor) One of two major categories of transistor; the other is bipolar. FETs use a gate element that, when charged, creates an electromagnetic field that changes the conductivity of a silicon
 device structures onto a variety of substrates of various sizes. These structures include T-gates and L-gates.

-- Patterning gratings and lenses onto various substrates.

Data fracturing, or pattern generation, is accomplished using Numerical Technologies' CATs, with many options of data conversion available. Pattern data can be sent using 3.5 inch floppy disk, CD, e-mail or FTP. Data can be streamed out in GDSII GDSII Graphic Design System II  format or JEOL 51. RSC's engineers are ready to assist with CAD if requested.

The JEOL JBX 6000FS/E machine is installed in the RSC Electronics Division clean room facility, which is an ISO (1) See ISO speed.

(2) (International Organization for Standardization, Geneva, Switzerland, www.iso.ch) An organization that sets international standards, founded in 1946. The U.S. member body is ANSI.
 9001 process lab. The JEOL operates at 25 or 50 kv. Multiple chucks are available for wafer sizes from 2 inch to 150 mm. Direct write overlay and field stitching accuracies of less then 50 nm are typical. The machine is capable of auto loading as many as 12 chucks, which speeds up the cycle time and also allows the machine to operate unattended.

Rockwell Scientific is an independent, privately owned high technology enterprise with unique technical strength in electronics, imaging, optics, materials, and information science. Its range of activities include contract research and development services for the U.S. government and private sector companies, as well as commercialization of selected technologies through licensing and the manufacturing and sale of high value products closely related to its R&D efforts.

For more information, visit http://www.rockwellscientific.com or call 805/373-4538.
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Publication:Electro Manufacturing
Date:Feb 1, 2003
Words:405
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