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Newest critical dimension scanning electron microscopes use NIST technology. (News Briefs).


Scanning electron microscopes scan·ning electron microscope
n. Abbr. SEM
An electron microscope that forms a three-dimensional image on a cathode-ray tube by moving a beam of focused electrons across an object and reading both the electrons scattered by the object and
 (SEM) are used extensively in the semiconductor production environment. NIST (National Institute of Standards & Technology, Washington, DC, www.nist.gov) The standards-defining agency of the U.S. government, formerly the National Bureau of Standards. It is one of three agencies that fall under the Technology Administration (www.technology.  scientists are helping to improve SEM performance with an objective diagnostic procedure to ensure data fidelity by looking at the sharpness measurements.

The concept of continuous or periodic sharpness monitoring has been incorporated into a new commercial critical dimension (CD) SEM. This CD-SEM CD-SEM Critical Dimension - Scanning Electron Microscopy  incorporates a "beam condition" monitor that provides numerical numerical

expressed in numbers, i.e. Arabic numerals of 0 to 9 inclusive.


numerical nomenclature
a numerical code is used to indicate the words, or other alphabetical signals, intended.
 and graphical descriptions of the condition of the instrument and documents the instruments condition over time.

CONTACT: Michael Postek, (301) 975-2299; michael. postek@nist.gov.
COPYRIGHT 2002 National Institute of Standards and Technology
No portion of this article can be reproduced without the express written permission from the copyright holder.
Copyright 2002, Gale Group. All rights reserved. Gale Group is a Thomson Corporation Company.

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Title Annotation:National Institute of Standards and Technology
Publication:Journal of Research of the National Institute of Standards and Technology
Article Type:Brief Article
Geographic Code:1USA
Date:May 1, 2002
Words:89
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