New JEOL Pattern Generator Installed at DPI Reticle Technology Center.

Business Editors/High-Tech Writers

ROUND ROCK, Texas--(BUSINESS WIRE)--Dec. 11, 2000

DuPont Photomasks, Inc. (Nasdaq:DPMI), commonly referred to as DPI, announced the installation of a JEOL JBX-9000MV electron-beam pattern generator in the DPI Reticle Technology Center (RTC). The new system will anchor a development and prototype line capable of producing photomasks for semiconductors with critical dimensions of 0.13 micron and below.

Photomasks, also known as reticles, are high-purity quartz or glass plates used by semiconductor producers to transfer circuit images onto silicon wafers. A pattern generator is a critical piece of equipment used by photomask manufacturers to "write" a semiconductor circuit design pattern onto the photomask.

The addition of the JEOL JBX-9000MV will give the RTC access to one of the most advanced e-beam pattern generators available today. The JBX-9000MV is a vector scan pattern generation system featuring high accuracy and high throughput. The system is based on an electron optical system featuring a variable shaped beam and 50 kV accelerating voltage. The JEOL JBX-9000MV is ideal for the production of advanced phase shift masks (PSM) and masks with optical proximity correction (OPC) which are necessary to extend current 248 nm lithography tools to 0.13 micron and below design rules.

"We believe the JEOL JBX9000MV is among the most sophisticated and powerful 0.13 micron e-beam tools on the market, which is why it was selected for the RTC," said Paul Chipman, general manager of the RTC and executive vice president and chief technology officer of DPI. "Since its introduction, we have been impressed with JEOL's ability to constantly improve this product line. As a result, we believe the platform is extendible well below 0.13 micron. The addition of this system is a part of our ongoing commitment to give customers access to the most advanced e-beam and laser writing tools in the world."

"In order to continue developing leading-edge photomasks, the RTC is investing in superior manufacturing equipment," said Craig Sander, vice president, Technology Development, Advanced Micro Devices, Inc. "However, access to state-of-the-art equipment is only one piece of the puzzle. Much of the RTC's success is a result of the collaborative efforts of its researchers and scientists, who are focused on developing the next generation photomask technologies."

"The work accomplished at the Reticle Techology Center enables the production of the most advanced photomasks available today," commented Bob Santorelli, Executive Vice President of JEOL. "We are pleased that the RTC chose to add the JBX-9000MV to its advanced technology development facility. The addition of this leading edge system will significantly enhance their development of 0.13 micron and below photomasks."

About DPI Reticle Technology Center (RTC)

The RTC is an advanced photomask R&D facility operated by DPI and its joint venture partners, Micron Technology (NYSE:MU), Advanced Micro Devices (NYSE:AMD) and Motorola (NYSE:MOT). It is an independent limited liability company formed in 1997. In May of this year, the four companies extended the operating agreement of the RTC through 2002. Housed in a 25,500-square-foot, stand-alone building in Round Rock, Texas, the RTC features a 6,500-square-foot cleanroom and is equipped with state-of-the-art photomask production and analytical equipment. The RTC employs about 70 scientists, engineers and technicians, including assignees from all member companies.

Over the past three years, the RTC has enabled its partners to create major new products by supplying photomasks used to manufacture the AMD Athlon(TM) family of microprocessors and Micron's advanced memory chips. It was instrumental in Motorola's successful prototyping of 0.10-micron gates using 248 nm lithography deep-ultraviolet (deep-UV) lithography in 1999. The RTC has also helped DPI to cascade photomask production breakthroughs to its manufacturing sites throughout the world, thereby accelerating the commercial fabrication of advanced semiconductor designs.

About DuPont Photomasks

DPI leads the photomask industry with one of the most technically advanced manufacturing networks. The company supplies photomasks to the global semiconductor industry from 11 strategically located facilities in North America, Europe and Asia, and derives approximately 25 percent of its current revenues from leading-edge photomasks with 0.18 micron or smaller design rules. Added to those facilities are two DPI materials facilities that produce photoblanks (photomask substrates) and pellicles (protective covers for photomasks). Headquartered in Round Rock, Texas, DPI posted worldwide sales of approximately $328 million in fiscal 2000. The company maintains a web site at www.photomask.com.

About AMD

AMD is a global supplier of integrated circuits for the personal and networked computer and communications markets. AMD produces microprocessors, flash memories, and integrated circuits for communications and networking applications. Founded in 1969 and based in Sunnyvale, Calif., AMD had revenues of $2.9 billion in 1999. For more information, please visit the company's web site at www.amd.com.

About Micron Technology

Micron Technology, Inc., and its subsidiaries manufacture and market DRAMs, very fast SRAMs, Flash, as well as other semiconductor components, memory modules, and personal computer systems. Micron's common stock is traded on the New York Stock Exchange (NYSE) under the symbol MU. To learn more about Micron Technology, Inc., visit its Web site at www.micron.com.

About Motorola

Motorola, Inc. is a global leader in providing integrated communications solutions and embedded electronic solutions. Sales in 1999 were $33.1 billion. As the world's No. 1 producer of embedded processors, Motorola's Semiconductor Products Sector offers multiple DigitalDNA(TM) technologies which enable its customers to create "smart" products and new business opportunities in the networking and computing, wireless communications, transportation, and imaging and entertainment markets. Motorola's worldwide semiconductor sales were $7.4 billion (USD) in 1999. For more information, please visit the company's web site at www.motorola.com.

Certain statements contained in this document that are not historical facts, are "forward-looking statements," as that term is defined in Section 27A of the Securities Act of 1933 and Section 21E of the Securities Exchange Act of 1934, that involve a number of risks and uncertainties. Such statements involve risks and uncertainties which may cause future activities and results of operations to differ from those suggested, including risks associated with research and development programs, fluctuations in demand, technology challenges in the manufacturer of advanced photomasks, installation and start-up of new equipment, accelerating technology requirements, and the need to manage growth. For additional information, please refer to DPI's filings with the Securities and Exchange Commission, specifically the company's most recent Forms 10-K dated September 15, 2000, the 10-Q dated November 1, 2000, and the S-3 most recently amended on September 11, 2000, which identify important risk factors that could cause actual results to differ from those contained in the forward-looking statements. Results for interim periods are not necessarily indicative of results for the year. The forward-looking statements are made as of the release date hereof and the company disclaims any intention or obligation to update or revise any forward-looking statement or to update the reasons why the actual results could differ materially from those projected in the forward-looking statements, whether as a result of new information, future events or otherwise.

Note to Editors: AMD, the AMD logo, AMD Athlon, and combinations thereof, are trademarks of Advanced Micro Devices, Inc. DigitalDNA is a trademark of Motorola, Inc.