National Institute of Advanced Industrial Science and Technology (AIST) Develops Desktop Apparatus Enabling Nanometer-scale Fabrication.Tokyo, Japan, Apr 3, 2006 - (JCN JCN Japan Corporate News JCN Journal of Cognitive Neuroscience JCN Journal of Cardiovascular Nursing JCN Journal of Christian Nursing JCN Job Control Number JCN Journal of Child Neurology JCN joint communications network (US DoD) ) - The National Institute of Advanced Industrial Science and Technology The National Institute of Advanced Industrial Science and Technology (産業技術総合研究所 (AIST AIST Advanced Industrial Science and Technology (Japan) AIST National Institute of Advanced Industrial Science and Technology (Japan) AIST Association for Iron & Steel Technology ) has developed a nano-fabrication technique utilizing a thermal lithography method resulting from the combination of visible-light lithography using a semi-conductor laser with a thermally nonlinear material. AIST combined a proprietary thermal lithography technique with optical disc-related techniques from Pulstec Industrial Co. Ltd., to developa nano-fabrication apparatus which enables the formation of 50 nm-fine structures over a wide area of 12 cm in diameter, the size of an optical disc, at high-speed. It is easy to handle because of its desktop size, and its price is one fourth of the corresponding conventional ones. The apparatus is easily handled by anyone, and enables nanometer-scale fabrication at low cost, which until now could only be done with expensive large apparatus using short wavelength light, such as vacuum ultraviolet light Ultraviolet light A portion of the light spectrum not visible to the eye. Two bands of the UV spectrum, UVA and UVB, are used to treat psoriasis and other skin diseases. (for the photolithography method) and electron beams (for the electron beam lithography Using electron beams to create the mask patterns directly on a chip. The wavelength of an electron beam is only a few picometers compared to the 248 to 365 nanometer wavelengths of light used to create the traditional photomasks. method). AIST expect their technique to facilitate reduction in the cost of optical devices with fine structures, e.g., photonic crystals and antireflective structures, and to be applied to nanotechnologies. This work will be presented at the 53rd Spring Meeting, 2006 The Japan Society of Applied Physics The Japan Society of Applied Physics (JSAP) originated in 1932 from a voluntary forum of researchers belonging to the University of Tokyo and the Institute of Physical and Chemical Research. During the World War II, most of research, even applied, was frozen. Then, only in y. on March 22-26 at Musashi Institute of Technology, and our apparatus will be displayed in the exhibition hall at the meeting. Copyright [c] 2006 Japan Corporate News Network. All rights reserved. |
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