Nanometrics Introduces Newest Optical CD Metrology Products Enabling Cost-Saving Advanced Process Control.
NanoStation[TM] Remote Analysis Uses Latest Generation RCWA-Based OCD OCD obsessive-compulsive disorder.
Obsessive-compulsive disorder (OCD) Software
MILPITAS, Calif. -- Nanometrics Incorporated (Nasdaq:NANO), a leading supplier of advanced metrology equipment to the semiconductor industry, today introduced its newest equipment and software products for optical critical dimension (OCD) metrology, a vital need in improving the manufacturability of advanced semiconductor device designs. The new NanoStation system is a remote analysis station incorporating the latest generation rigorous coupled-wave analysis (RCWA RCWA Rigorous Coupled-Wave Analysis
RCWA Revised Code of Washington Annotated )-based OCD software.
The NanoStation features state-of-the-art multi-core CPU CPU
in full central processing unit
Principal component of a digital computer, composed of a control unit, an instruction-decoding unit, and an arithmetic-logic unit. technology and Nanometrics' advanced ADAP ADAP AIDS Drug Assistance Program
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ADAP Advanced Digital Antenna Production scatterometry modeling software. It enables process engineers to utilize the full power of OCD measurement technologies, including both normal incidence reflectometry (NI-OCD) and spectroscopic spec·tro·scope
An instrument for producing and observing spectra.
spectro·scop ellipsometry (SE-OCD) methods, and quickly transfer data between Nanometrics' standalone and integrated platforms - Atlas, FLX FLX Finger Lakes (New York)
FLX Fort Lauderdale Executive (airport code)
FLX Federal Learning eXchange
FLX Flatfishes and 9010 Series systems. Nanometrics has already begun shipping its new NanoStation systems.
"Increased OCD capability is a critical component to an advanced process control (APC (1) (American Power Conversion Corporation, West Kingston, RI, www.apcc.com) The leading manufacturer of UPS systems and surge suppressors, founded in 1981 by Rodger Dowdell, Neil Rasmussen and Emanual Landsman, three electronic power engineers who had worked at MIT. ) strategy that will help ensure that future semiconductor designs become reality through lower device costs," said David Doyle David Doyle can be
"Our latest OCD software release has been designed to provide significant advancements in 3-D profile modeling for complex structures required for 45nm and 32nm technology," added Doyle. "The flexibility of both turnkey and software-only solutions enables cost of ownership benefits and ease of deployment to our customers."
Nanometrics is a leader in the design, manufacture and marketing of high-performance process control metrology systems used in semiconductor manufacturing. Nanometrics standalone and integrated metrology systems measure various thin film properties, critical dimensions, overlay control and optical, electrical and material properties, including the structural composition of silicon and compound semiconductor devices, during various steps of the manufacturing process. These systems enable semiconductor manufacturers to improve yields, increase productivity and lower their manufacturing costs. The Company maintains its headquarters in Milpitas, California, with sales and service offices worldwide. Nanometrics is traded on NASDAQ Global Market under the symbol NANO. Nanometrics' website is http://www.nanometrics.com.