NOVA MEASURING DEBUTS NOVATRACK 3030 WAFER INSPECTION SYSTEM.

Nova Measuring Instruments Ltd. (NASDAQ: NVMI), Rehovoth, Israel, developer of integrated process control systems for the semiconductor industry, has launched its NovaTrack(R)3030, the first complete system to enable real-time overlay and macro defect inspection on each wafer produced.

Current methods of photolithography metrology are struggling to keep pace with the ever-increasing inspection standards required to control both present and future technology processes. In macro defect detection, less than 10% of wafers are actually inspected for potential yield-limiting defects, due to time constraints. Since inspection has typically required wafers to be visually inspected by technicians, traditional methods create further interruptions, adding both time and cost to the process.

Based on Nova's integrated metrology (IM) concept, the NovaTrack(R)3030 transforms metrology into a value-added operation. It guarantees improved yield through complete inspection and detection of macro defects, and offers improved exposure system control throughout real-time overlay measurement. The system is based on a unique platform developed by the company, which detects particles, coat and develop-related defects and EBR (edge bead removal) results with zero-added particles. It improves the automation of the critical photolithography operation, contributes to the overall productivity of the fab, and improves yield and cycle time.

Nova has already successfully developed and integrated the NovaTrack(R) systems into multiple Photoresist Tracks of some of the leading process equipment manufacturers. The systems have been tested in production environments and full implementation into semiconductor manufacturing is underway.

NovaTrack(R)3030 is also available as an Engineering Station, a stand-alone metrology tool that facilitates the evaluation and implementation of the Integrated Process Control technologies and Advanced Process Control of photolithography, the fastest forward moving technology in the fab. This enables fabs without NovaReady equipment to realize the full benefits of the NovaTrack(R)3030.

Commenting on the announcement, Dr. Gad Yaron, Lithography Product Line manager of Nova, said, "Based on the positive evaluation of the NovaTrack(R)2020, our dual-purpose overlay measurement and macro inspection system, it is our belief that the benefits brought to semiconductor manufacturers in the transition to 300mm manufacturing will be even more significant. With the help of the NovaTrack(R)3030, the move to 300mm manufacturing will be faster, with a noticeably shorter time to yield. As the industry leader, we are committed to making this transition process as manageable as possible for our customers."

About Nova

Nova Measuring Instruments Ltd. develops, designs and produces integrated process control systems in the semiconductor manufacturing industry. Nova provides a broad range of integrated process control solutions that link between different semiconductor processes and process equipment.

For more information, visit http://www.nova.co.il or call 212/896-1258.