NIST leads industry round-robin of photonic semiconductor characterization. (News Briefs).NIST (National Institute of Standards & Technology, Washington, DC, www.nist.gov) The standards-defining agency of the U.S. government, formerly the National Bureau of Standards. It is one of three agencies that fall under the Technology Administration (www.technology. is conducting an industry interlaboratory comparison of ex situ characterization of InGaAsP films on InP that are the basis of long-haul telecommunication components. Lack of standardized standardized pertaining to data that have been submitted to standardization procedures. standardized morbidity rate see morbidity rate. standardized mortality rate see mortality rate. assessment procedures for InGaAsP was identified as a major impediment A disability or obstruction that prevents an individual from entering into a contract. Infancy, for example, is an impediment in making certain contracts. Impediments to marriage include such factors as consanguinity between the parties or an earlier marriage that is still valid. for photonics manufacturers at the Optoelectronics Industry Development Association Metrology metrology Science of measurement. Measuring a quantity means establishing its ratio to another fixed quantity of the same kind, known as the unit of that kind of quantity. Workshop. The characterization techniques under study are x-ray rocking curves, photoluminescence, and photoreflectance. The x-ray technique and photoluminescence are commonly used to qualify wafers wafers compressed roughage in flat plates useful for feeding to animals in transit. for device processing. Wafers having compositions corresponding to emission wavelengths ranging from 1.0 mm to 1.55 mm were obtained from industry. Mapping of full wafers demonstrated that uniformity is clearly an issue in this material system, therefore the specimens in the study are from the most uniform part of each wafer. Participants in the round-robin include laser manufacturers, epitaxial film suppliers, and measurement instrumentation manufacturers. The first participant, a major optoelectronics manufacturer, stated that their involvement had already been very valuable; the process of measuring the specimens uncovered assumptions that had limited their understanding of their data and its accuracy. NIST's development of accurate assessment procedures for InGaAsP will enable sharing of data between laboratories and improve predictive modeling for manufacturers of semiconductor lasers, detectors, and amplifiers. This is especially critical in light of the increasing, industry trend to outsource the growth of epitaxial layers In chip making, a semiconductor layer that is created on top of the silicon base rather than below it. See molecular beam epitaxy. . CONTACT: Alexana Roshko, (303) 497-5420; roshko@ boulder.nist.gov and Robert Hickernell, (301) 975-3455; hickernell@boulder.nist.gov. |
|
||||||||||||||||||||
Printer friendly
Cite/link
Email
Feedback
Reader Opinion