NIST HOSTS RTP 2000 AND RELATED WORKSHOP.

RTP (1) (Rapid Transport Protocol) The protocol used in IBM's High Performance Routing (HPR) system.

(2) (Realtime Transport Protocol) An IP protocol that supports real time transmission of voice and video. 2000: The 8th International Conference on Advanced Processing of Semiconductors was held in Gaithersburg, MD in September 2000. NIST (National Institute of Standards & Technology, Washington, DC, www.nist.gov) The standards-defining agency of the U.S. government, formerly the National Bureau of Standards. It is one of three agencies that fall under the Technology Administration (www.technology. was a co-sponsor.

Presentations by NIST staff included talks on calibration of light-pipe radiation thermometers with the NIST-patented thin-film thermocouple calibration wafer, and on the characterization of light-pipe radiation thermometers in rapid thermal processing Rapid Thermal Processing (or RTP) refers to a semiconductor manufacturing process which heats silicon wafers to high temperatures (up to 1200 C or greater) on a timescale of several seconds or less. (RTP) measurements, and on modeling of radiation thermometer thermometer, instrument for measuring temperature. Galileo and Sanctorius devised thermometers consisting essentially of a bulb with a tubular projection, the open end of which was immersed in a liquid. measurements in RTP. Other talks at the conference related to advanced methods of temperature measurement and control described novel methods of emissivity Emissivity

The ratio of the radiation intensity of a nonblack body to the radiation intensity of a blackbody. This ratio, which is usually designated by the Greek letter ε, is always less than or just equal to one. cancellation, modulation-based temperature measurement, and non-parametric adaptive temperature control. There was strong interest in measuring temperature on the International Temperature Scale of 1990 (ITS-90), rather than local process scales, and finding ways to trace the measurements in RTP to NIST.

Prior to RTP 2000, a workshop was held at NIST on Temperature Measurement of Semiconductor Wafers using Thermocouples, with 58 participants. The workshop included talks by staff on the general properties and calibration of thermocouples; the use and properties of thin-film thermocouples; and the application here at NIST of wafers instrumented with thermocouples to calibrate To adjust or bring into balance. Scanners, CRTs and similar peripherals may require periodic adjustment. Unlike digital devices, the electronic components within these analog devices may change from their original specification. See color calibration and tweak. light-pipe radiation thermometers in an RTP apparatus. Additional talks by industry experts described practical issues in the temperature measurements of wafers in both batch and RTP processing environments, and discussed instrumentation techniques for accurate thermocouple measurements.

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Publication:	Journal of Research of the National Institute of Standards and Technology
Article Type:	Brief Article
Geographic Code:	1USA
Date:	Mar 1, 2001
Words:	215
Previous Article:	NIST/FIZ-KARLSRUHE PARTNERSHIP TO IMPROVE THE INORGANIC CRYSTAL STRUCTURE DATABASE FOR MATERIALS RESEARCH.
Next Article:	NIST DIGITAL CINEMA 2001 CONFERENCE DRAWS INDUSTRY TO DISCUSS STANDARDS.(Brief Article)
Topics:	Semiconductors Conferences, meetings and seminars

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