Mykrolis Releases New Filters and Manifold to Optimize Gel, Particle and Agglomerate Removal.
BEDFORD, Ma.--(BUSINESS WIRE)--April 25, 2002
As the industry searches for new methods to reduce wafer defects and transitions to 300 mm CMP applications, contamination becomes more problematic and filtration at point of use rises in importance.
In response, Mykrolis Corporation (NYSE: MYK), a leading supplier to the semiconductor industry, announces disposable, five-inch Solaris(R) SLR01 and SLR03 Filters and the Solaris Manifold to reduce defect-causing particles, gels and agglomerates.
The SLR01 Filter meets small footprint requirements mandated for 300 mm CMP applications and optimizes the dispensing of fine particle slurries throughout Copper and STI processes. The SLR03 Filter manages larger particle slurries in oxide and metal processes. Comparative tests indicate Solaris filtration technology reduces wafer defects by a factor of 10.
The Solaris filters' propriety construction, with four inches of media specifically designed to retain gels and agglomerates, enables the filters to last more than twice the life of conventional depth filters. A self-venting feature allows microbubbles to flow through the filters and avoid potential slurry dry out.
Requiring no tools during maintenance, Solaris Manifold provides rapid filter change-out, easy installation or retrofit into existing tools and built-in safety precautions to limit chemical exposure.
Mykrolis Corporation, based in Bedford, Massachusetts, is a global supplier of advanced process solutions for gas and liquid filters and delivery systems for the semiconductor, flat panel, fiber optic and optical disc industries. Mykrolis is formerly the Microelectronics Division of Millipore Corporation. For more information, visit www.mykrolis.com.