Mitsubishi Gas Chemical Builds a New Manufacturing Plant for ArF Photo Resist Monomer.Tokyo, Japan, Aug 11, 2006 - (JCN JCN Japan Corporate News JCN Journal of Cognitive Neuroscience JCN Journal of Cardiovascular Nursing JCN Journal of Christian Nursing JCN Job Control Number JCN Journal of Child Neurology JCN joint communications network (US DoD) ) - Mitsubishi Gas Chemical has completed an ArF Photo resist monomer monomer (mŏn`əmər): see polymer. monomer Molecule of any of a class of mostly organic compounds that can react with other molecules of the same or other compounds to form very large molecules (polymers). manufacturing plant in its Yokkaichi facility, Mie Prefecture. Using proprietary Mitsubishi technology for adamantine adamantine /ad·a·man·tine/ (ad?ah-man´tin) pertaining to the enamel of the teeth. adamantine pertaining to the enamel of the teeth. derivatives, the factory is due for operation in mid-August and distribution of sample products will start in September. With growing demand in the market, forecasts call for 10-fold production requirement by 2010. As a top maker of hydrogen peroxide hydrogen peroxide, chemical compound, H2O2, a colorless, syrupy liquid that is a strong oxidizing agent and, in water solution, a weak acid. It is miscible with cold water and is soluble in alcohol and ether. , Mitsubishi has engaged in the manufacture of adamantane derivatives. Going forward, Mitusbishi is working to develop efficient oxidizing methods for various adamantine related derivatives. Copyright [c] 2006 Japan Corporate News Network. All rights reserved. |
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