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Metryx Wins Multi-System Mentor Order from Research Consortium.


BRISTOL, England -- Metryx, Limited, a supplier of mass metrology equipment to the semiconductor manufacturing industry, today announced that it has received orders from a major research consortium for its Mentor SF3 300 mm tool and Mentor OC23 200 mm tool. During the evaluation phase, the Mentor successfully identified previously undetected process trends, demonstrating the value mass metrology offers to the industry.

In the facility, the tools will be used to monitor a number of applications including shallow trench isolation Shallow trench isolation (STI) is an integrated circuit feature which prevents electrical current leakage between adjacent semiconductor device components. STI is generally used on CMOS process technology nodes of 250 nanometers and smaller. , etch To create a design in a material by digging out the material. The circuit designs on printed circuit boards and chips are etched by acid. See chip and printed circuit board. , deposition and CMP CMP (cytidine monophosphate): see cytosine.


(1) (CMP Media LLC, Manhasset, NY, www.cmp.com) Part of United Business Media, CMP is a leading integrated media company that offers a wide variety of publications and services in the information
 for both metal and dielectric dielectric (dī'ĭlĕk`trĭk), material that does not conduct electricity readily, i.e., an insulator (see insulation). A good dielectric should also have other properties: It must resist breakdown under high voltages; it should not  layers. The Mentor demonstrated high enough throughput to be used as an inline metrology tool and because it is non-destructive it can be used directly on device wafers.

"These orders from an industry-leading R&D center clearly show the value-add mass metrology brings to semiconductor manufacturing," explained Dr. Adrian Kiermasz, CEO (1) (Chief Executive Officer) The highest individual in command of an organization. Typically the president of the company, the CEO reports to the Chairman of the Board.  of Metryx, Ltd. "So many processes have a measurable mass change and the Mentor's versatility allows it to ensure process repeatability across a broad spectrum of manufacturing technologies. This makes it extremely valuable to semiconductor fabs, and in particular those working with novel processes or high product mix scenarios."

Mentor Mass Metrology

The Mentor offers an innovative mass measurement technology that is able to measure any mass change resulting from a process change with atomic level accuracy. The tool monitors the mass of any wafer following a process step to quickly determine whether device manufacture process steps are operating consistently using passive data collection (PDC (1) (Primary Domain Controller) A Windows NT/2000 service that manages security for its local domain. Every domain has one PDC, which contains a database of usernames, passwords and permissions. ) and normal distribution analysis. The ability to quickly and accurately identify any process drift allows the process to be corrected or stopped immediately, saving scrap or preventing yield loss.

The Mentor offers atomic level repeatability, low cost of ownership and high return on investment. The small-footprint Mentor is capable of throughputs of 60 wafers per hour to enable nanotechnology mass measurement of production wafers, as well as test and blanket wafers, independent of substrate size or material.

Metryx will be exhibiting at SEMICON SEMICON Semiconductors Equipment and Material International Conference  West in San Francisco San Francisco (săn frănsĭs`kō), city (1990 pop. 723,959), coextensive with San Francisco co., W Calif., on the tip of a peninsula between the Pacific Ocean and San Francisco Bay, which are connected by the strait known as the Golden , Calif., from July 17 - 19, 2007. Please visit them in the West Hall, Level 2, Booth 8157 to learn more about the Mentor and mass metrology.

About Metryx

Metryx is a semiconductor equipment manufacturer specializing in unique nanotechnology mass measurement techniques. Based in Bristol, England, Metryx's non-destructive 200mm and 300mm metrology tools offer atomic layer accuracy making them ideal for material characterization and device manufacture process control. For more information on the company and its products, please visit www.metryx.net.
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Copyright 2007, Gale Group. All rights reserved. Gale Group is a Thomson Corporation Company.

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Publication:Business Wire
Date:Jul 17, 2007
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