Mentor Graphics Aids in Rapid Adoption of GDSII Replacement Format.Business Editors & Technology Writers WILSONVILLE, Ore.--(BUSINESS WIRE)--Sept. 30, 2002 Mentor Graphics Mentor Graphics, Inc (NASDAQ: MENT) is a US-based multinational corporation dealing in electronic design automation (EDA) for electrical engineering and electronics, as of 2004, ranked third in the EDA industry it helped create. Corporation (Nasdaq:MENT) today announced plans to support the (yet unnamed) GDSII GDSII Graphic Design System II replacement format in the Mentor Graphics(R) Calibre(R) product family and the IC Station(R) tool suite in commercial release as soon as the first quarter of 2003. The new format is a replacement to GDSII, which has been used in the industry to transfer physical design data for decades. This next-generation, non-proprietary, interchange file format (file format) Interchange File Format - (IFF, full name "EA IFF 1985") A generic file format published by Electronic Arts as an open standard. IFF is chunk-based and hierarchical so files can include other files. It is easily extensible and an all round Good Idea. will be first used for leading-edge technology nodes See technology generation. , such as 130nm, 90nm and 65nm. Mentor Graphics played many instrumental roles in the delivery of the new format. The most notable were agreeing to take on the editing responsibility for the specification, the initial specification itself (Version 3 SLF SLF Super Low Frequency (30-300 Hz; 10,000-1,000 km) SLF Self SLF Statens Landbruksforvaltning (Norwegian Agricultural Authority) SLF Sveriges Läkarförbund SLF Saalfeld ), and assigning Mentor employees, including one of Mentor's top software engineers, Laurence Grodd, as technical editor, and several other individuals as liaisons to the SEMI NSF NSF - National Science Foundation WG (SEMI New Stream Format Working Group). Mentor agreed to hand off all proprietary rights to Version 3 SLF and any subsequent versions that include numerous contributions from Working Group members from other EDA companies The new encapsulated format specification offers substantial improvements in data volume efficiency. To date, testing shows up to 10-50 times reductions in hierarchical data volume from GDSII, and up to two or more times reduction in flat data volume from MEBES mode5 format. With the new format, file-based flows become more efficient, even in multi-tool environments, by reduced read/write times, and the ability to attain greater leverage from hierarchical processing. Due to inefficiencies in the GDSII format, the best hierarchical processing applications were handicapped at output time; with the new format the differences in data handling efficiency of hierarchical EDA (1) (Electronic Design Automation) Using the computer to design, lay out, verify and simulate the performance of electronic circuits on a chip or printed circuit board. application software will become even more obvious. In addition, the format offers portability across platforms and a single physical file to hand-off across organizational boundaries, such as from IC design groups to merchant mask manufacturers or internal mask-makers. "More than 40 people, representing over 20 companies, participated in the working group to develop this new interchange format. Mentor Graphics was involved from the inception, serving for many months as editor of the draft specification, and incorporating many successive sets of modifications for the working group. Mentor devoted some of their most talented people to this project, and participated actively in every working group session. We look forward to seeing a broad range of industry support for the new format," said Kurt Wampler, chairman of the SEMI New Stream Format Working Group. "Calibre's leadership in resolution enhancement such as OPC (1) (OpenGL Performance Characterization) A project group within GPC that manages OpenGL benchmarks. OPC endorses the Viewperf and GLperf benchmarks. Viewperf was created by IBM and OPC provides viewsets for it, which are combinations of tests using specific , entry in the mask data preparation Mask data preparation is the step that translates an intended set of polygons on an integrated circuit layout into a form that can be physically written by the photomask writer. market, and interaction with leading-edge IC customers triggered the internal development of a next-generation data format some time ago," said Joseph Sawicki, general manager of Mentor Graphics Design-to-Silicon division. "We contributed our work in this area, without limitation, because we believe meaningful standards adoptions must be truly open. We are convinced this new SEMI standard format will improve the industry's ability to profitably build more advanced semiconductor products." About Mentor Graphics Mentor Graphics Corporation (Nasdaq:MENT) is a world leader in electronic hardware and software design solutions, providing products, consulting services and award-winning support for the world's most successful electronics and semiconductor companies. Established in 1981, the company reported revenues over the last 12 months of about $600 million and employs approximately 3,700 people worldwide. Corporate headquarters are located at 8005 S.W. Boeckman Road, Wilsonville, Oregon Wilsonville is a city in Clackamas County, Oregon, United States. The population was 13,991 at the 2000 census, and as of 2005 was estimated to be 16,510.[1] Geography Wilsonville is located at (45.306805, -122. 97070-7777; Silicon Valley headquarters are located at 1001 Ridder Park Drive, San Jose, California San Jose (IPA: /ˌsænhoʊˈzeɪ/) is the third-largest city in California, and the tenth-largest in the United States. It is the county seat of Santa Clara County. 95131-2314. World Wide Web site: www.mentor.com. Mentor Graphics, Calibre and IC Station are registered trademarks of Mentor Graphics Corporation. All other company or product names are the registered trademarks or trademarks of their respective owners. |
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