Major IC Players Present Computational Lithography Seminar.Experts From Toshiba, NEC (NEC Corporation, Tokyo, www.nec.com, www.necus.com) An electronics conglomerate known in the U.S. for its monitors. In Japan, it had the lion's share of the PC market until the late 1990s (see PC 98). NEC was founded in Tokyo in 1899 as Nippon Electric Company, Ltd. , Nikon, DNP, Hitachi, Magma, Cadence and Brion Will Examine How This Emerging Technology Addresses Systematic Defects in Semiconductor Manufacturing SANTA CLARA, Calif. -- Brion Technologies Inc., the pioneer and leader in Lithography-Driven Design & Manufacturing([TM]), will be sponsoring a seminar on computational lithography in Tokyo on October 12. The seminar features expert speakers from Toshiba Corp., NEC Electronics, Nikon Corp., Dai Nippon Printing Dai Nippon Printing (大日本印刷 Dai Nippon Insatsu , Hitachi High-Technologies Corp., Magma Design Automation Magma Design Automation (NASDAQ: LAVA) is a software company in the electronic design automation (EDA) industry. The company was founded in 1997 and maintains headquarters in San Jose, California. Inc. and Cadence Design Systems (company) Cadence Design Systems - A company that sells electronic design automation software and services. http://cadence.com/. See also Verilog. Inc., as well as presentations from Brion Technologies. Semiconductor International Japan, the Japanese edition of a leading technical publication addressing the global semiconductor industry, will be the media partner for the event. While the industry is demanding high numerical aperture (NA) lithography and other techniques such as immersion technology to extend 193nm lithography, systematic defects derived from the associated resolution enhancement techniques (RET) and optical proximity correction Optical proximity correction (OPC) is a photolithography enhancement technique commonly used to compensate for image errors due to diffraction or process effects. The two most common applications for OPC are linewidth differences between features in regions of different density (e. (OPC) are multiplying rapidly. Presenters at this seminar will discuss how to address this problem through computational lithography. This emerging technology is used to apply and verify pattern proximity corrections and sub-resolution assist features (SRAF) on full-chip layouts, specifically processes such as SRAF placement, model-based RET/OPC and model-based RET/OPC verification. [TABLE OMITTED] About Brion Technologies Brion Technologies, Inc. is the pioneer and leader in Lithography-Driven Design & Manufacturing([TM]). Founded in 2002, the privately held company privately held company A firm whose shares are held within a relatively small circle of owners and are not traded publicly. is headquartered in Santa Clara, California Santa Clara, California (IPA: /ˌsæntəˈklærə/) , founded in 1777 and incorporated in 1852, is a city in Santa Clara County, in the U.S. state of California. . Brion's Tachyon[TM] platform, a highly accurate and ultra-fast OPC and OPC verification engine, enables a unique set of capabilities that address the interrelated challenges of design, photomask making and wafer printing in semiconductor lithography. With more than 125 employees, the company leads the worldwide market for optical proximity correction (OPC) verification, and is rapidly expanding in the OPC market. For further information, visit Brion Technologies' Web site at www.brion.com or call +1 (408) 653-1500. Lithography-Driven Design & Manufacturing and Tachyon are trademarks of Brion Technologies, Inc. |
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