International SEMATECH Exercises Option to Purchase Total Molecular Base Real Time Monitor From Extraction Systems.Business/Technology Editors FRANKLIN, Mass.--(BUSINESS WIRE)--March 27, 2000 Extraction Systems Inc. today announced that International SEMATECH SEMATECH Semiconductor Manufacturing Technology has exercised an option to purchase the company's 10-Point, Total Molecular Base Real Time Monitor (TMB-RTM). The system has been installed in International SEMATECH's Advanced Technology Development Facility (ATDF ATDF American Tap Dance Foundation ATDF Advanced Technology Development Facility, Inc (Austin, TX) ATDF ASCII Test Data Format (semi-conductor industry) ATDF Automated Target Data Fusion ) in Austin, Texas under an equipment loan agreement between the consortium and Extraction Systems since 1998. "Extraction System's Real Time Monitor is crucial to monitoring the fab ambient air, deep ultraviolet coat and expose equipment environment for molecular bases, which can have a devastating impact on both 193 nm and 157 nm photoresists," said Kim Dean, International SEMATECH project manager. "SEMATECH member companies can expect to learn valuable and timely information from this collaboration." International SEMATECH has been using the TMB-RTM for 193 nm photoresist development work for the past year. It will now be used in International SEMATECH's 157 nm photoresist development program, which is underway. Photoresist development remains a key hurdle on the 1999 International Technology Roadmap for Semiconductors The International Technology Roadmap for Semiconductors is a set of documents produced by a group of semiconductor industry experts. These experts are representative of the sponsoring organisations which include the Semiconductor Industry Associations of the US, Europe, Japan, . Photoresists used in conjunction with 193 nm and 157 nm lithography are extremely sensitive to airborne molecular contaminants (AMCs), generally defined as airborne acids, bases, and condensables that can hurt semiconductor processing. Unless AMCs are closely monitored and filtered, they can have a disastrous effect on wafer fab yields. All fabs that use chemically amplified photoresist are susceptible to AMCs and must remove them to safeguard DUV DUV Deep Ultraviolet DUV Data-Under-Voice DUV Design Under Verification lithography processes. About the Total Molecular Base Real Time Monitor (TMB-RTM) The TMB-RTM is an easy-to-use, automated instrument that quantitatively analyzes total AMC (Advanced Mezzanine Card) See AdvancedTCA. content including ammonia, NMP NMP New Millennium Program (NASA) NMP National Military Park (National Park Service) NMP N-Methylpyrrolidone NMP Network Management Protocol NMP Not My Problem and all other amines amines (  mēnz´),n.pl organic compounds that contain nitrogen. -- with 500 part per trillion sensitivity. This is twice as sensitive as commercially available chemically amplified photoresists. About Extraction Systems Extraction Systems Inc. produces a wide range of airborne molecular contamination (AMC) measurement and control products for ultraclean environments. Headquartered in Franklin, Mass., the company provides solutions to the global microelectronics industry in partnership with Hermes Epitek and Metron Technology. http://www.extractionsystemsinc.com |
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