Intel, DNP to Extend Collaboration in Future Mask Technology Development.Tokyo, Japan, Jan 20, 2006 - (JCN JCN Japan Corporate News JCN Journal of Cognitive Neuroscience JCN Journal of Cardiovascular Nursing JCN Journal of Christian Nursing JCN Job Control Number JCN Journal of Child Neurology JCN joint communications network (US DoD) ) - Intel and Dai Nippon Printing Dai Nippon Printing (大日本印刷 Dai Nippon Insatsu (DNP DNP n. Deoxyribonucleoprotein; a complex of DNA and protein that usually yields DNA upon cell disruption and isolation. DNP 2,4-dinitrophenol. ) have announced that they will extend their mask development collaboration to cover photo mask technologies for the 32nm process technology. Intel is expected to launch 32nm miroprocessor production on a commercial basis as early as 2009. The two companies will work on both argon fluoride (ArF) excimer laser and extreme ultraviolet (EUV EUV Extreme Ultraviolet EUV Exclusive Use Vehicle EUV Extreme Ultra Violet ) lithography. Since 2000, they have collaborated in photo mask development for 180nm to 45nm process technologies. The partners will provide timely mask capabilities in support of EUV lithography insertion. Copyright [c] 2006 Japan Corporate News Network. All rights reserved. |
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