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1-100 out of 100 article(s)

Title	Author	Type	Date	Words
United States: FABS21 Benchmarking Tool Will Help Semiconductor Manufacturing Facilities Improve Energy-Efficiency.			Nov 24, 2009	452
United States: InnerSense Introduces a New Diagnostics Instrument for High Volume Semiconductor Manufacturing Environment.			Nov 13, 2009	215
SEMATECH Symposia Reveal Continuing Momentum in EUVL and 193 nm Immersion Extensions.			Nov 12, 2009	804
Chartered Adopts Brion's Computational Lithography Solutions.			Nov 2, 2009	501
UMC moves to ramp up 300mm Fab capacity.			Sep 23, 2009	353
New Chip Fabrication Technology on the Verge of Volume Production.			Sep 16, 2009	745
Rudolph Technologies Indicates Recovery Taking Hold, Back-end Semiconductor Manufacturing Heating Up.			Sep 16, 2009	678
KLA-Tencor's New TeronTM 600 Reticle Defect Inspection Platform Addresses Mask Design Discontinuities at the 2Xnm Node.			Sep 14, 2009	984
TSMC, Fujitsu microelectronics to collaborate on 28nm process technology.		Brief article	Sep 2, 2009	270
Taiwan: Taiwan Semiconductor Manufacturing Company Expands its Association with Global Unichip.			Aug 5, 2009	264
AMD Joins GLOBALFOUNDRIES to Break Ground on Industry-Leading Semiconductor Manufacturing Facility in Upstate New York.			Jul 24, 2009	359
Tyndall National Institute Chooses Cambridge NanoTech's Plasma ALD System to Enhance Semiconductor Fabrication.			Jul 22, 2009	449
ASML Introduces Holistic Lithography Solutions to Continue Moore's Law.			Jul 14, 2009	421
United States: ASML and Cymer Announce Advancement in EUV to Enable Manufacturing of Integrated Circuits for Years to Come.			Jul 14, 2009	470
HamaTech's New MaskTrack Pro System Delivers Technology for Next Generation Lithography.			Jul 14, 2009	533
ASML and Cymer Announce Advancement in EUV to Enable Manufacturing of Integrated Circuits for Years to Come.			Jul 13, 2009	1133
United States: TSMC Joins the CEA-Leti Program on Multiple E-Beam Lithography for IC Manufacturing.			Jul 7, 2009	346
TSMC Joins the CEA-Leti Program on Multiple E-Beam Lithography for IC Manufacturing.			Jul 6, 2009	526
Europe Makes Strides on Sustainable Semiconductor Manufacturing.			Jun 29, 2009	729
United States: Novellus' Peter Wolters Division Develops 22nm Double-Sided Silicon Wafer Polish Process.			Jun 27, 2009	460
United States: Novellus Peter Wolters Division Develops 22nm Double-Sided Silicon Wafer Polish Process.			Jun 25, 2009	460
AMD Welcomes GLOBALFOUNDRIES' Commitment to Build Industry-Leading Semiconductor Manufacturing Facility in Upstate New York.			Jun 9, 2009	279
Diffusion and morphological properties of syndiotactic polypropylene (sPP) films.	Yamashita, Kohtaro; Fujiwara, Narumi; Fujikawa, Yuichiro; Nakaoki, Takahiko; Chiu, Wen-Yen; Stroeve,	Report	Apr 1, 2009	3866
Embedded chip manufacturing.			Apr 1, 2009	73
Brion Releases State-of-the-Art Source Mask Optimization for Advanced Semiconductor Manufacturing.			Feb 23, 2009	530
Brion and Cymer Collaborate to Improve Computational Lithography Modeling.			Feb 20, 2009	446
United States: AMD stockholders approve chip manufacturing spin-off on second try.			Feb 20, 2009	121
AMD and the Advanced Technology Investment Company Secure Final Approval Necessary to Create New Leading-Edge Semiconductor Manufacturing Company.			Feb 18, 2009	979
Analysis of mold insert fabrication for the processing of microfluidic chip.	Shen, Y.K.; Lin, J.D.; Hong, R.H.	Technical report	Jan 1, 2009	4470
Thermoforming triangular troughs.	Lieg, Katie Lynn; Giacomin, A.Jeffrey	Report	Jan 1, 2009	7082
Germany: Applied Materials Introduces Aerial Imaging to the Wafer Fab for Boosting Lithography Productivity.			Dec 2, 2008	395
Applied Materials Introduces Aerial Imaging to the Wafer Fab for Boosting Lithography Productivity.			Dec 1, 2008	459
ASML Sets Productivity Records across the Spectrum of TWINSCAN Models; Establishes New Standards of Semiconductor Manufacturing Capability.			Nov 19, 2008	333
FEI's New TrueCrystal Package Provides Rapid, Accurate Strain Profiling for Semiconductor Manufacturing.			Nov 3, 2008	624
ASML's New TWINSCAN NXT Immersion Lithography Platform Brings Overlay and Productivity Breakthroughs to Power Next Phase of Semiconductor Manufacturing.			Oct 15, 2008	895
ISMI Symposium to Feature "State of Semiconductor Manufacturing" Panel Discussion.		Discussion	Oct 14, 2008	325
AMD and Advanced Technology Investment Company (ATIC) to Create New Leading-Edge Semiconductor Manufacturing Company.			Oct 7, 2008	128
AMD and Advanced Technology Investment Company of Abu Dhabi to Create New Leading-Edge Semiconductor Manufacturing Company.			Oct 7, 2008	3413
KLA-Tencor Introduces PROLITH(TM) 12 - A Computational Lithography Tool Aimed at EUV Lithography Challenges.			Sep 30, 2008	591
UJnited States: Fujitsu looks for chip making allies.			Sep 11, 2008	178
United States: Voltaix raises USD 12.5 million from Intel Capital for hybrid solar/chip fabrication material.			Jul 30, 2008	109
ASML Extends Immersion to the Limit of Single-Patterning Lithography.			Jul 15, 2008	696
FEI Connectivity Solutions Improve and Accelerate TEM Imaging for Semiconductor Manufacturing.			Jul 15, 2008	652
Japan : KLA-Tencor Launches First Computational Lithography Tool To Address Double-Patterning Challenges.			Jul 11, 2008	386
KLA-Tencor Launches First Computational Lithography Tool To Address Double-Patterning Challenges.			Jul 10, 2008	533
Gauda, Inc., the Company that Accelerates Computational Lithography, Announces its Advisory Board.			May 30, 2008	946
Mentor Graphics Qualifies Calibre Model-based Planarity Flow for TSMC's 65 and 40 nanometer IC Manufacturing Processes.			May 29, 2008	437
Verigy and Cadence Present Seminar Series on Optimized Solutions for Yield Analysis & Learning in Semiconductor Manufacturing.			May 27, 2008	423
Taiwan semiconductor manufacturing Co.			May 16, 2008	98
Cymer Installs XLR 500i Light Source at IMEC.			Apr 29, 2008	888
SEMATECH's Litho Forum Spotlights High-Stakes Shift to Next-Generation Manufacturing.			Apr 23, 2008	419
ASML Ships 1000th KrF Lithography System; Milestone Confirms KrF Leadership in Productivity and System Extendibility.			Apr 22, 2008	822
Strained Silicon Technology Holds a Promising Future for Ultra High-speed Computing Devices.			Apr 3, 2008	699
AMD Testing Functional Devices Made Using Extreme Ultra-Violet (EUV) Lithography on Test Chip.			Feb 26, 2008	703
Good things, small packages.	Madler, Mark R.		Feb 4, 2008	417
Don't forget the filters.			Feb 1, 2008	136
BCD Semiconductor Manufacturing Limited Files Registration Statement with the US SEC for an Initial Public Offering of its American Depositary Shares.			Jan 28, 2008	287
SEMATECH Announces 2008 SEMATECH Knowledge Series.			Jan 24, 2008	1268
Brion's Tachyon OPC+ Selected by NEC Electronics to Enable 40nm IC Production.			Jan 22, 2008	366
KLA-Tencor and Nikon Develop Automated Overlay Correction Tools for Cost-Effective Mix & Match 45nm Lithography.		Correction notice	Dec 7, 2007	867
Blaze DFM Lithography-Aware Design Optimization Demo Now Available.			Nov 5, 2007	377
AMD Puts Customer at Center of Chip Manufacturing in ISMI Opening Keynote Address.			Oct 24, 2007	517
Formation of group 12 [Zn, Cd] mixed-chalcogen nanoparticles from the reagent [Me.sub.3]Si-SeS-Si[Me.sub.3] (1).	Turner, Elizabeth A.; Rosner, Harald; Huang, Yining; Corrigan, John F.	Report	Oct 1, 2007	8444
Cross-linking organic semiconducting molecules by preferential C-H cleavage via "chemistry with a tiny hammer" (1).	Lau, W.M.; Zheng, Z.; Wang, Y.H.; Luo, Y.; Xi, L.; Wong, K.W.; Wong, K.Y.	Report	Oct 1, 2007	5471
Semiconductor manufacturing companies.			Sep 28, 2007	149
Bidding Open in EARBid(TM) Online Auction of Semiconductor Manufacturing, Inspection, and Test Equipment.			Sep 25, 2007	261
Applied Chemical Laboratories Introduces a Non-Corrosive, BEOL Post Etch Residue Remover for sub-90 nm Semiconductor Manufacturing.			Sep 24, 2007	668
Brion Releases Imaging Solutions to Support Advanced Memory and Logic Scaling.			Sep 18, 2007	624
The Advent of Next Generation Lithography Technologies in Advanced Semiconductor Processing.			Aug 27, 2007	772
Semiconductor Manufacturing International Corporation (SMIC) Honors Rohm and Haas With Excellent Supplier Award.			Aug 27, 2007	491
Cabot Microelectronics Corporation Receives Supplier Award from Semiconductor Manufacturing International Corporation (SMIC).			Jul 23, 2007	554
Intevac to Introduce New "Lean Etch(TM)" Semiconductor Manufacturing System at SEMICON West.			Jun 25, 2007	326
Lam Research Corporation's 2300(R) Motif(TM) Post-lithography Pattern Enhancement System Breaks Advanced Lithography Barrier.			Jun 19, 2007	844
Embossing of high-aspect-ratio-microstructures using sacrificial templates and fast surface heating.	Lu, Chunmeng; Cheng, Mark Ming-Cheng; Benatar, Avraham; Lee, L. James		Jun 1, 2007	4373
Verigy and Mentor Graphics to Co-Host Semiconductor Manufacturing Yield Learning and Logic Diagnosis Seminar Series.			May 29, 2007	380
New MOSIS Shared Wafer Service on IBM's 130nm 8WL Process Makes High-Performance RF Chip Fabrication Affordable.			Mar 2, 2007	340
At SPIE, SEMATECH Reviews Success Stories in Preparing EUV for Manufacturing.			Feb 28, 2007	707
Molecular Imprints Announces the Imprio(R) 1100 Precision Imprint Lithography System.			Feb 12, 2007	509
2007 SEMATECH Knowledge Series Focuses on Lithography, Materials & Manufacturing.			Jan 29, 2007	1010
Brion, TOOL Corp. Unveil Integrated IC Design Environment.			Jan 18, 2007	943
KLA-Tencor Accelerates Customers' 45nm Immersion Lithography Yield and Productivity With New Archer 100 Optical Overlay Metrology System.			Dec 7, 2006	786
Microfabrica, Inc.			Dec 4, 2006	69
Hynix Adopts ASML's LithoCruiser for Advanced Process Development.			Nov 30, 2006	378
GenISys Announces Layout LAB Simulation Software Enabling Design for Manufacture For MEMS (DfMM).			Nov 30, 2006	934
Mentor Graphics Releases Next-Generation OPC Solution.		Company overview	Nov 29, 2006	916
Brion, Hitachi High-Technologies Collaborate on Common DFM Platform.			Nov 28, 2006	722
SEMATECH-led Workshops Scope Progress & Challenges for EUV Manufacturing.			Nov 22, 2006	1266
UMC Produces Working 45-nanometer ICs.			Nov 20, 2006	607
Nikon Announces New Ultra High Throughput Stepper.			Nov 20, 2006	538
PennWell Corp. (Tulsa, OK) has launched PennTechJobs.com, a new web site that serves the recruitment needs of engineers working in the fields of communications, electronics, photonics, optoelectronics, military aerospace, nanotechnology and semiconductor manufacturing.			Nov 1, 2006	47
Vistec Selects Grant Bespoke Refrigeration Solution For E-Beam Nano-Lithography Machine.		Company overview	Oct 31, 2006	477
Amkor Continues Expansion of 300mm Wafer Bumping Capacity with SUSS MicroTec Lithography Solutions.			Oct 24, 2006	605
"More Moore" Shows European EUV Innovation at EUV 2006 in Barcelona.			Oct 17, 2006	517
Japanese Electronics Maker Utilizes Brion's Tachyon OPC+ For 65nm Manufacturing.			Oct 3, 2006	492
Major IC Players Present Computational Lithography Seminar.			Oct 3, 2006	315
Savant Company Inc. Announces Two Unique and Innovative Conferences on System-on-Chip (SoC), Chip Design Methodologies and IC Manufacturing.			Oct 2, 2006	454
Brion Receives Wall Street Journal Tech Innovation Award.			Sep 28, 2006	553
Long-sought laser? Standard microchips may gain speedy optical connections.	Weiss, P.		Sep 23, 2006	546
Bringing Over 20 Years of Semiconductor Manufacturing Experience, Elke Eckstein Joins AMD as Vice President of Fab 30.			Sep 21, 2006	344
Fujitsu Licenses MoSys 1T-SRAM(R) Technology for Its Leading-Edge 65nm Semiconductor Manufacturing Process; Targets Graphic Applications with Low Power, Fast Speed, and High-Density Embedded Memory Requirements.			Sep 20, 2006	675