GenISys Announces Enhanced Layout Beamer, Giving Users the Best Choice for Direct Write e-Beam Data Prep & PEC.

First All-in-One Solution Combines Ease of Use, Performance, Productivity and Best Value

MUNICH, Germany -- Users of e-Beam lithography now have a powerful new software tool from GenISys GmbH, a leading-edge provider of software solutions for efficient processing of large layout data and optimization of microstructure fabrication. GenISys today unveiled Layout BEAMER 2.0, a high-performance yet easy-to-use data preparation solution that combines the robust layout processing of GenISys' Layout ENGINE with powerful proximity effect correction (PEC) and the ease of the VisualFLOW(TM) platform, all in one package.

At the heart of Layout BEAMER 2.0 is GenISys' high-performance layout processing tool-kit, Layout ENGINE, which is incorporated in several equipment manufacturer systems. Carl Zeiss has incorporated the Layout ENGINE of GenISys in their popular mask repair system, MeRiT(TM), and proven the capability of full chip data handling at major device manufacturers.

Layout BEAMER 2.0 closes the full layout processing chain from the design data in all major formats to writing on the major e-Beam machines such as Vistec, JEOL and Raith by "fracturing" to the desired machine formats. Its ability to handle a large volume of layout data quickly is coupled with VisualFLOW's user-friendly, drag-and-drop interface, which enables users to easily design complex, hierarchical process flows and to define and save them as custom modules.

Layout BEAMER 2.0 users can also define design parameters as variables and vary them in loops, which in turn provides strong automation and optimization abilities. They can then save these customized modules and flows to construct a "corporate knowledge base."

PEC is a critical step in obtaining reliable, repeatable beam writer performance and superior critical dimension (CD) control on advanced circuit patterns. The state-of-the-art PEC found in Layout BEAMER is further enhanced in Version 2.0 for use in measured or calculated tables, in addition to multi-Gaussian correction.

In the face of rising costs for mask-making and conventional lithography, direct-write technology is becoming more and more attractive for device development, prototyping and small-volume fabrication for both device manufacturers and researchers. Data preparation is an important step in e-Beam processes, directly influencing the quality of the pattern reproduced on the wafer. Increasing layout complexity and demands on pattern fidelity have created new challenges, however, and process correction has become an important part of the preparation process. But the direct-write market has long needed solutions to address these specific needs in a quick, efficient manner -- until now.

"We at GenISys are committed to providing a high level of service to this community. Data preparation for e-Beam direct write has long suffered with several issues: from a technical standpoint, there is poorly integrated data prep/process correction tools and error-prone operation because of high process flow variability. From a commercial standpoint, there is poor customer responsiveness coupled with the high pricing of the software available to direct write users," said Ulrich Hofmann, founder and general manager of GenISys. "Layout BEAMER 2.0 addresses these issues and satisfies the needs of the direct-write market as a comprehensive, integrated, cost-effective solution that combines all the required functions of process flow management and automation capabilities."

Thanks to Layout BEAMER 2.0's flexible, modular architecture, it is also highly customizable. As part of its focus on responsiveness to customer needs and quality support services, GenISys works closely with customers to ensure that Layout BEAMER meets their unique development needs and environment.

"From a technical point of view, data prep and in particular process correction tools are poorly integrated and difficult to use. Layout BEAMER provides a fast, flexible and highly efficient framework for our e-Beam data prep needs," said Dr. Andre Van der Hart, Director of e-Beam Lithography in the Process Technology Department of the Institute of Bio- & Nano-Systems at Research Center JE-lich-Germany. "With its intuitive usage and flexibility that supports multiple layouts and machine formats, Layout BEAMER is a uniquely versatile data prep resource - and is amazingly fast and easy to implement."

Availability and System Requirements 

Layout BEAMER 2.0 is competitively priced and available now directly from GenISys GmbH. It supports the Windows XP, Windows 2000 and LINUX operating systems. For more information on Layout BEAMER, contact GenISys at [e-mail] or [phone].

About GenISys

Based in Munich, Germany, GenISys GmbH develops, markets and supports flexible, high-performance software solutions for the highly efficient processing of large layout data and the optimization of microstructure fabrication processes. Addressing the market for direct-write e-Beam and optical lithography, GenISys combines deep technical expertise in layout data processing, process modeling, correction and optimization with high-caliber software engineering and a focus on ease of use. GenISys products give researchers, IC and MEMS manufacturers and system suppliers unparalleled efficiency, ease of use and optimal value in research, development and production of new micropatterning technologies.

As a company focused on customer service, GenISys delivers fast, flexible support for integration, customization and development of specialized functionality to meet unique customer needs. For more information on GenISys, visit our Web site at www.genysis-gmbh.de.

GenISys is a registered trademark and Layout BEAMER, Layout ENGINE and VisualFLOW are trademarks of GenISys GmbH. All other trademarks are the property of their respective holders.